PROCEEDINGS VOLUME 7504
LASER DAMAGE SYMPOSIUM XLI: ANNUAL SYMPOSIUM ON OPTICAL MATERIALS FOR HIGH POWER LASERS | 21-23 SEPTEMBER 2009
Laser-Induced Damage in Optical Materials: 2009
IN THIS VOLUME

0 Sessions, 62 Papers, 0 Presentations
Front Matter  (1)
Thin Films  (14)
Proceedings Volume 7504 is from: Logo
LASER DAMAGE SYMPOSIUM XLI: ANNUAL SYMPOSIUM ON OPTICAL MATERIALS FOR HIGH POWER LASERS
21-23 September 2009
Boulder, Colorado, United States
Front Matter
Proc. SPIE 7504, Front Matter: Volume 7504, 750401 (19 January 2010); doi: 10.1117/12.856139
Thin Films
Proc. SPIE 7504, The effect of nitrogen doping on the multiple-pulse subpicosecond dielectric breakdown of hafnia films, 750402 (31 December 2009); doi: 10.1117/12.836504
Proc. SPIE 7504, Studies of femtosecond laser induced damage of HfO2 thin film in atmospheric and vacuum environments, 750403 (31 December 2009); doi: 10.1117/12.836505
Proc. SPIE 7504, Surface damage of thin AlN films with increased oxygen content by nanosecond and femtosecond laser pulses, 750404 (31 December 2009); doi: 10.1117/12.836865
Proc. SPIE 7504, Laser damage resistant pits in dielectric coatings created by femtosecond laser machining, 750405 (31 December 2009); doi: 10.1117/12.836906
Proc. SPIE 7504, Thermal robustness of ion beam sputtered TiO2/SiO2, TiO2/Al2O3, and Al2O3/SiO2 IR anti-reflective coatings on YAG and sapphire substrates, 750406 (31 December 2009); doi: 10.1117/12.836490
Proc. SPIE 7504, Optimization of scandia thin films for high power laser coating applications, 750407 (31 December 2009); doi: 10.1117/12.836915
Proc. SPIE 7504, Laser conditioning of high reflectivity mirrors used in OPOs by 266 and 355 nm nanosecond pulses, 750408 (31 December 2009); doi: 10.1117/12.836496
Proc. SPIE 7504, 193 nm laser induced spectral shift in HR coated mirrors, 750409 (31 December 2009); doi: 10.1117/12.836262
Proc. SPIE 7504, Design consideration for high damage threshold UV-Vis-IR mirrors, 75040A (31 December 2009); doi: 10.1117/12.835787
Proc. SPIE 7504, Investigation in oxide mixture coatings with adapted gradient index profiles, 75040B (31 December 2009); doi: 10.1117/12.836462
Proc. SPIE 7504, Meeting thin film design and production challenges for laser damage resistant optical coatings at the Sandia Large Optics Coating Operation, 75040C (31 December 2009); doi: 10.1117/12.836597
Proc. SPIE 7504, Influence of subsurface defects on 355 nm laser damage resistance of monolayer and multilayer coatings, 75040D (31 December 2009); doi: 10.1117/12.836189
Proc. SPIE 7504, Anti-reflection coating damage threshold dependence on substrate material, 75040E (31 December 2009); doi: 10.1117/12.836456
Proc. SPIE 7504, Optical coatings with ultralow refractive index SiO2 films, 75040F (31 December 2009); doi: 10.1117/12.836252
Fundamental Mechanisms
Proc. SPIE 7504, Ultrafast laser-induced modifications of energy bands of non-metal crystals, 75040G (31 December 2009); doi: 10.1117/12.836908
Proc. SPIE 7504, Laser-induced damage and nonlinear absorption of ultrashort laser pulses in the bulk of fused silica, 75040H (31 December 2009); doi: 10.1117/12.836705
Proc. SPIE 7504, Influence of Na-related defects on DUV nonlinear absorption in CaF2: nanosecond versus femtosecond laser pulses, 75040I (31 December 2009); doi: 10.1117/12.836354
Proc. SPIE 7504, A microscopic model for long-term laser damage in calcium fluoride, 75040J (31 December 2009); doi: 10.1117/12.836404
Proc. SPIE 7504, Biaxial flexural strength of optical window materials, 75040K (31 December 2009); doi: 10.1117/12.836920
Proc. SPIE 7504, Modeling wet chemical etching of surface flaws on fused silica, 75040L (31 December 2009); doi: 10.1117/12.836912
Proc. SPIE 7504, Modeling of light intensification by conical pits within multilayer high reflector coatings, 75040M (31 December 2009); doi: 10.1117/12.836916
Mini-Symposium: Femtosecond Laser Damage
Proc. SPIE 7504, Analysis in wavelength dependence of electronic damage, 75040N (31 December 2009); doi: 10.1117/12.836701
Proc. SPIE 7504, Time-resolved digital holography: a versatile tool for femtosecond laser-induced damage studies, 75040O (31 December 2009); doi: 10.1117/12.836473
Proc. SPIE 7504, Fundamental processes controlling the single and multiple femtosecond pulse damage behavior of dielectric oxide films, 75040P (31 December 2009); doi: 10.1117/12.836508
Proc. SPIE 7504, Subpicosecond pulse laser damage behavior of dielectric thin films prepared by different techniques, 75040Q (31 December 2009); doi: 10.1117/12.836500
Proc. SPIE 7504, Mixed metal dielectric gratings for pulse compression applications, 75040R (31 December 2009); doi: 10.1117/12.836063
Proc. SPIE 7504, Thin film femtosecond laser damage competition, 75040S (31 December 2009); doi: 10.1117/12.837473
Surfaces, Mirrors, and Contamination
Proc. SPIE 7504, Aspects of laser optics qualification for space applications, 75040T (31 December 2009); doi: 10.1117/12.837384
Proc. SPIE 7504, The effects on glass surfaces of shrapnel and debris emissions from Petawatt laser driven solid targets, 75040U (31 December 2009); doi: 10.1117/12.836108
Proc. SPIE 7504, Impact of outgassing organic contamination on laser induced damage of optics, 75040V (31 December 2009); doi: 10.1117/12.836384
Proc. SPIE 7504, Chemical characterizations of optical materials: a tool for high quality components, 75040W (31 December 2009); doi: 10.1117/12.836358
Proc. SPIE 7504, Laser damage precursors in fused silica, 75040X (31 December 2009); doi: 10.1117/12.836986
Proc. SPIE 7504, Diagnostics tools for subsurface damage characterization of ground silica parts, 75040Y (31 December 2009); doi: 10.1117/12.836368
Proc. SPIE 7504, Birefringence and residual stress induced by CO2 laser mitigation of damage growth in fused silica, 75040Z (31 December 2009); doi: 10.1117/12.836238
Proc. SPIE 7504, Residual stress and damage-induced critical fracture on CO2 laser treated fused silica, 750410 (31 December 2009); doi: 10.1117/12.836904
Proc. SPIE 7504, Study of CO2 laser smoothing of surface roughness in fused silica, 750411 (31 December 2009); doi: 10.1117/12.836907
Proc. SPIE 7504, The effect of pulse duration on the growth rate of laser-induced damage sites at 351 nm on fused silica surfaces, 750412 (31 December 2009); doi: 10.1117/12.836905
Proc. SPIE 7504, Magnetorheological finishing (MRF) of potassium dihydrogen phosphate (KDP) crystals: nonaqueous fluids development, optical finish, and laser damage performance at 1064 nm and 532 nm, 750414 (31 December 2009); doi: 10.1117/12.836913
Materials and Measurements
Proc. SPIE 7504, Nonlinear spectroscopy: absorption and refraction, 750415 (31 December 2009); doi: 10.1117/12.834788
Proc. SPIE 7504, Ultrafast photoluminescence as a diagnostic for laser damage initiation, 750416 (31 December 2009); doi: 10.1117/12.836923
Proc. SPIE 7504, Photoluminescence and photothermal deflection measurements in KDP crystals for high power applications, 750417 (31 December 2009); doi: 10.1117/12.836235
Proc. SPIE 7504, Imaging system to measure kinetics of material cluster ejection during exit-surface damage initiation and growth in fused silica, 750418 (31 December 2009); doi: 10.1117/12.836922
Proc. SPIE 7504, High temperature thermographic measurements of laser heated silica, 750419 (31 December 2009); doi: 10.1117/12.836985
Proc. SPIE 7504, Early thermal damage in optical coatings identified by infrared spectral signatures, 75041A (31 December 2009); doi: 10.1117/12.835783
Proc. SPIE 7504, Process for rapid detection of fratricidal defects on optics using linescan phase-differential imaging, 75041B (31 December 2009); doi: 10.1117/12.836990
Proc. SPIE 7504, Laser-induced surface damage density measurements of fused silica optics: a parametric study, 75041C (31 December 2009); doi: 10.1117/12.836346
Proc. SPIE 7504, Numerical analysis of laser-induced damage threshold search algorithms and their uncertainty, 75041D (31 December 2009); doi: 10.1117/12.836469
Proc. SPIE 7504, Spot-size dependence of the LIDT from the NIR to the UV, 75041E (31 December 2009); doi: 10.1117/12.836066
Proc. SPIE 7504, Adaptive laser-induced damage detection, 75041F (31 December 2009); doi: 10.1117/12.836479
Proc. SPIE 7504, Optical damage testing at the Z-Backlighter facility at Sandia National Laboratories, 75041G (31 December 2009); doi: 10.1117/12.836917
Proc. SPIE 7504, Angle resolved scattering: a method for in situ investigations of laser-induced damage?, 75041H (31 December 2009); doi: 10.1117/12.850389
Proc. SPIE 7504, Life testing for laser optics: a first look, 75041I (31 December 2009); doi: 10.1117/12.837393
Proc. SPIE 7504, Damage and degradation of optics and sensors under intense EUV radiation from a table-top laser produced plasma source, 75041J (31 December 2009); doi: 10.1117/12.837357
Proc. SPIE 7504, Modeling laser conditioning of KDP crystals, 75041K (31 December 2009); doi: 10.1117/12.836064
Proc. SPIE 7504, Laser conditioning process combining N/1 and S/1 programs to improve the damage resistance of KDP crystals, 75041L (31 December 2009); doi: 10.1117/12.836187
Proc. SPIE 7504, Nanosecond-laser induced damage at 1064 nm, 532 nm, and 355 nm in LiB3O5, 75041M (31 December 2009); doi: 10.1117/12.836489