PROCEEDINGS VOLUME 7545
26TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | 18-20 JANUARY 2010
26th European Mask and Lithography Conference
26TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE
18-20 January 2010
Grenoble, France
Front Matter
Proc. SPIE 7545, Front Matter: Volume 7545, 754501 (22 May 2010); doi: 10.1117/12.867647
Plenary Session I
Proc. SPIE 7545, Mask industry assessment trend analysis: 2010, 754502 (14 May 2010); doi: 10.1117/12.865509
EUV I
Proc. SPIE 7545, Impact of mask absorber on EUV imaging performance, 754503 (15 May 2010); doi: 10.1117/12.864251
Proc. SPIE 7545, Overview of IP error compensation techniques for EUVL, 754504 (15 May 2010); doi: 10.1117/12.863556
Proc. SPIE 7545, Contributions to EUV mask metrology infrastructure, 754505 (15 May 2010); doi: 10.1117/12.865750
Maskless Lithography I
Proc. SPIE 7545, Multi-shaped beam data preparation, 754506 (15 May 2010); doi: 10.1117/12.864245
Proc. SPIE 7545, Checkerboard pattern for PSF parameter determination in electron beam lithography, 754507 (15 May 2010); doi: 10.1117/12.864315
Metrology
Proc. SPIE 7545, Update on next generation metrology tool for DPL reticles, 754508 (15 May 2010); doi: 10.1117/12.863100
Proc. SPIE 7545, CD forecasting in resist by means of scatterometry, 754509 (15 May 2010); doi: 10.1117/12.864431
Proc. SPIE 7545, A 193nm microscope for CD metrology for the 32nm node and beyond, 75450A (15 May 2010); doi: 10.1117/12.863627
Data Preparation, Simulation, and RET I
Proc. SPIE 7545, Deployment of OASIS in the semiconductor industry: status, dependencies, and outlook, 75450B (15 May 2010); doi: 10.1117/12.864158
Proc. SPIE 7545, Rigorous EMF simulation of absorber shape variations and their impact on lithographic processes, 75450C (15 May 2010); doi: 10.1117/12.863595
Proc. SPIE 7545, Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis, 75450D (15 May 2010); doi: 10.1117/12.863102
Data Preparation, Simulation, and RET II
Proc. SPIE 7545, Proximity effect correction sensitivity analysis, 75450E (15 May 2010); doi: 10.1117/12.863710
Proc. SPIE 7545, Modified dose correction strategy for better pattern contrast, 75450F (15 May 2010); doi: 10.1117/12.863376
Resist, Repair, and Cleaning
Proc. SPIE 7545, 193nm resist deprotection study from outgassing measurements by TD-GCMS/FID, 75450G (15 May 2010); doi: 10.1117/12.863150
Proc. SPIE 7545, Increasing mask yield through repair yield enhancement utilizing the MeRiT, 75450H (15 May 2010); doi: 10.1117/12.863861
Proc. SPIE 7545, Study of the molecular contaminants deposition on Cr, MoSi and SiO[sub]2[/sub] surfaces representative of photomasks layers, 75450I (15 May 2010); doi: 10.1117/12.863877
Proc. SPIE 7545, Mask cleaning process evaluation and modeling, 75450J (15 May 2010); doi: 10.1117/12.864335
Application
Proc. SPIE 7545, Mask lithography for display manufacturing, 75450K (15 May 2010); doi: 10.1117/12.865780
Proc. SPIE 7545, Deep-UV KrF lithography for the fabrication of Bragg gratings on SOI rib waveguides, 75450L (15 May 2010); doi: 10.1117/12.863538
Proc. SPIE 7545, Mask phase and transmission variation effects on wafer critical dimensions for nodes 65nm and 45nm, 75450M (15 May 2010); doi: 10.1117/12.863147
EUV II
Proc. SPIE 7545, Study of real defects on EUV blanks and a strategy for EUV mask inspection, 75450N (15 May 2010); doi: 10.1117/12.863559
Proc. SPIE 7545, Defect inspection with an EUV microscope, 75450O (15 May 2010); doi: 10.1117/12.863818
Proc. SPIE 7545, e-beam induced EUV photomask repair: a perfect match, 75450P (15 May 2010); doi: 10.1117/12.863542
Maskless Lithography II
Proc. SPIE 7545, Projection mask-less lithography and nanopatterning with electron and ion multi-beams, 75450Q (15 May 2010); doi: 10.1117/12.863143
Proc. SPIE 7545, Low voltage resist processes developed for MAPPER tool first exposures, 75450R (15 May 2010); doi: 10.1117/12.863146
Nanoimprint Lithography
Proc. SPIE 7545, Template masters for substrate conformal imprint lithography generated by charged particle nanopatterning techniques, 75450S (15 May 2010); doi: 10.1117/12.863198
Proc. SPIE 7545, Positive or negative tone resist for a T-NIL/UVL hybrid process, 75450T (15 May 2010); doi: 10.1117/12.863199
Proc. SPIE 7545, Antisticking layers on antireflective chromium for hybrid (CNP) nanoimprint molds, 75450U (15 May 2010); doi: 10.1117/12.865572
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