PROCEEDINGS VOLUME 7802
SPIE OPTICAL ENGINEERING + APPLICATIONS | 1-5 AUGUST 2010
Advances in X-Ray/EUV Optics and Components V
Proceedings Volume 7802 is from: Logo
SPIE OPTICAL ENGINEERING + APPLICATIONS
1-5 August 2010
San Diego, California, United States
Front Matter
Proc. SPIE 7802, Front Matter for Volume 7802, 780201 (22 October 2010); doi: 10.1117/12.877481
X-ray Optics and Applications
Proc. SPIE 7802, Development of a one-dimensional Wolter mirror for an advanced Kirkpatrick-Baez mirror, 780202 (27 August 2010); doi: 10.1117/12.860405
Proc. SPIE 7802, WSi2/Si multilayer sectioning by reactive ion etching for multilayer Laue lens fabrication, 780203 (29 September 2010); doi: 10.1117/12.865306
Proc. SPIE 7802, Compensation of fabrication errors in segmented x-ray optics, 780204 (27 August 2010); doi: 10.1117/12.864031
VUV, SX Optics, and Applications
Proc. SPIE 7802, Beam splitting mirrors for miniature Fourier transform soft x-ray (FTXR) interferometer, 780206 (27 August 2010); doi: 10.1117/12.859147
Proc. SPIE 7802, High-efficiency multilayer blazed gratings for EUV and soft x-rays: recent developments, 780207 (27 August 2010); doi: 10.1117/12.861287
Proc. SPIE 7802, Optical properties of carbon coatings for extreme-ultraviolet high-order laser harmonics, 780208 (27 August 2010); doi: 10.1117/12.861597
Proc. SPIE 7802, Compact spectrometer for the analysis of high harmonics content of extreme-ultraviolet free-electron-laser radiation, 780209 (27 August 2010); doi: 10.1117/12.861615
Multilayers and Applications
Proc. SPIE 7802, DLC/Si multilayer mirrors for EUV radiation, 78020A (29 September 2010); doi: 10.1117/12.861165
Proc. SPIE 7802, In-situ stress measurements of sputtered multilayers, 78020B (27 August 2010); doi: 10.1117/12.860354
Proc. SPIE 7802, Stress analysis of Mo, MoSi2 and Si mono-layer thin films and multilayers prepared by magnetron sputtering, 78020E (6 October 2010); doi: 10.1117/12.860268
Mirrors, Zone Plates, and Applications
Proc. SPIE 7802, Investigation of aberrations of Kirkpatrick-Baez mirrors, 78020F (27 August 2010); doi: 10.1117/12.859850
Proc. SPIE 7802, Platinum Kirkpatrik-Baez mirrors for a hard x-ray microfocusing system made by profile coating, 78020G (27 August 2010); doi: 10.1117/12.861044
Proc. SPIE 7802, Computer-controlled cylindrical polishing process for development of grazing incidence optics for the hard x-ray region, 78020H (29 September 2010); doi: 10.1117/12.862635
X-ray Sources and Detectors
Proc. SPIE 7802, Robust liquid metal collector mirror for EUV and soft x-ray plasma sources, 78020K (27 August 2010); doi: 10.1117/12.860747
Optics and Beam Coherence
Proc. SPIE 7802, Micro-imaging performance of multilayers used as monochromators for coherent hard x-ray synchrotron radiation, 78020M (27 August 2010); doi: 10.1117/12.858355
Proc. SPIE 7802, Beam coherence and x-ray windows, 78020O (6 October 2010); doi: 10.1117/12.877449
Proc. SPIE 7802, Analysis of mutual coherence of x-ray beam from rocking curves by perfect crystal, 78020P (27 August 2010); doi: 10.1117/12.860547
Poster Session
Proc. SPIE 7802, Modeling complex x-ray optical systems, 78020R (29 September 2010); doi: 10.1117/12.861774
Proc. SPIE 7802, EUV spectroscopic imaging observations of the first mission of Japanese small scientific satellites series, 78020S (27 August 2010); doi: 10.1117/12.853566
Proc. SPIE 7802, Compact extreme ultraviolet source by use of a discharge-produced potassium plasma for surface morphology application, 78020T (25 August 2010); doi: 10.1117/12.858603
Proc. SPIE 7802, Improved synchrotron performance from indium antimonide crystals, 78020U (27 August 2010); doi: 10.1117/12.859706
Proc. SPIE 7802, Ultrasound artificial anisotropy of crystals in x-ray frequency range, 78020W (27 August 2010); doi: 10.1117/12.863276
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