Front Matter: Volume 7920
Proc. SPIE 7920, Front Matter: Volume 7920, 792001 (16 March 2011); doi: 10.1117/12.890189
Fundamental Aspects of Laser Interaction
Proc. SPIE 7920, Zinc ion and neutral emission from single crystal zinc oxide during 193-nm excimer laser exposure, 792002 (17 February 2011); doi: 10.1117/12.873607
Proc. SPIE 7920, Absorption of femtosecond laser pulse in fused silica: experiments and modelling, 792003 (22 February 2011); doi: 10.1117/12.872736
Proc. SPIE 7920, Effects of the source, surface, and sensor couplings and colorimetric of laser speckle pattern on the performance of optical imaging system, 792005 (22 February 2011); doi: 10.1117/12.874074
Laser Microscale Materials Processing
Proc. SPIE 7920, Glass welding technology using ultra short laser pulses, 792006 (22 February 2011); doi: 10.1117/12.881183
Proc. SPIE 7920, Reliable laser micro-welding of copper, 792007 (22 February 2011); doi: 10.1117/12.875033
Proc. SPIE 7920, Advanced micro-machining applications for low nanosecond low M2 fiber lasers, 792008 (4 March 2011); doi: 10.1117/12.876325
Proc. SPIE 7920, Processing of metals with ps-laser pulses in the range between 10ps and 100ps, 792009 (22 February 2011); doi: 10.1117/12.879498
Surface Microstructuring and Cleaning
Proc. SPIE 7920, Generation of superfine structure smaller than 10 nm by interfering femtosecond laser processing, 79200B (22 February 2011); doi: 10.1117/12.881184
Proc. SPIE 7920, Surface morphology of SiO2 coated InP/InGaAs/InGaAsP microstructures following irradiation with the ArF and KrF excimer lasers, 79200C (22 February 2011); doi: 10.1117/12.879453
Laser Modification of Materials
Proc. SPIE 7920, Sintering of solution-based nano-particles by a UV laser pulse train, 79200I (22 February 2011); doi: 10.1117/12.872007
Thin Film and Wafer Processing: Joint Session with Conference 7925
Proc. SPIE 7920, Investigation on solid state Nd[sup]3+[/sup]:YAG line beam laser annealing and texturing of amorphous silicon thin films, 79200M (22 February 2011); doi: 10.1117/12.874844
Femtosecond Laser Nanoprocessing: Joint Session with Conference 7925
Proc. SPIE 7920, Nanostructure formation on silicon surfaces by high repetition-rate sub-15 femtosecond near-infrared laser pulses, 79200P (22 February 2011); doi: 10.1117/12.873596
Proc. SPIE 7920, Optimization methods of hologram for holographic femtosecond laser processing, 79200Q (22 February 2011); doi: 10.1117/12.873487
Laser Processing of Transparent Materials
Proc. SPIE 7920, Novel applications of sub-surface laser machining, 79200T (22 February 2011); doi: 10.1117/12.876050
Proc. SPIE 7920, CO2 laser scribe of chemically strengthened glass with high surface compressive stress, 79200U (22 February 2011); doi: 10.1117/12.874925
Processing with Novel Laser Systems and Optics
Proc. SPIE 7920, Laser surface structuring with long depth of focus, 79200W (22 February 2011); doi: 10.1117/12.881189
Proc. SPIE 7920, A study on 8 beam laser diode to adopt laser scanning unit, 79200X (22 February 2011); doi: 10.1117/12.874273
Proc. SPIE 7920, Advantages offered by high average power picosecond lasers, 79200Y (22 February 2011); doi: 10.1117/12.872391
Proc. SPIE 7920, Novel 1.2kW UV laser system for micro fabrication and annealing, 79200Z (22 February 2011); doi: 10.1117/12.874977
Proc. SPIE 7920, Three-dimensional structuring inside transparent materials by a phase modulated fs laser beam with a LCOS-SLM, 792010 (22 February 2011); doi: 10.1117/12.881190
Photovoltaics/Energy Devices: Joint Session with Conference 7921
Proc. SPIE 7920, Innovative laser based solar cell scribing, 792011 (22 February 2011); doi: 10.1117/12.877060
Poster Session
Proc. SPIE 7920, Generation of complicated or duplicated structure by interfering femtosecond laser processing of metallic thin film, 792013 (22 February 2011); doi: 10.1117/12.874407
Proc. SPIE 7920, Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses, 792015 (25 February 2011); doi: 10.1117/12.875897
Proc. SPIE 7920, Evaluation of a refractive index profile for a modification induced by focused femtosecond laser irradiation in the optical glasses, 792018 (22 February 2011); doi: 10.1117/12.876096
Proc. SPIE 7920, Laser cutting of carbon fiber reinforced plastics (CFRP) by UV pulsed laser ablation, 792019 (22 February 2011); doi: 10.1117/12.876231
Proc. SPIE 7920, F[sub]2[/sub] laser formation of SiO[sub]2[/sub] protective layer onto polycarbonate for lightweight vehicle window, 79201A (22 February 2011); doi: 10.1117/12.878450
Proc. SPIE 7920, Patterning of aluminum thin films by 157nm F[sub]2[/sub] laser, 79201B (22 February 2011); doi: 10.1117/12.879788
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