PROCEEDINGS VOLUME 7927
SPIE MOEMS-MEMS | 22-27 JANUARY 2011
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Proceedings Volume 7927 is from: Logo
SPIE MOEMS-MEMS
22-27 January 2011
San Francisco, California, United States
Front Matter
Proc. SPIE 7927, Front Matter: Volume 7927, 792701 (29 March 2011); doi: 10.1117/12.891639
Nanofabrication I: Photonic Nanostructures
Proc. SPIE 7927, Photolithographic fabrication of slot waveguides, 792704 (5 February 2011); doi: 10.1117/12.876093
Proc. SPIE 7927, Environmentally responsive active optics based on hydrogel-actuated deformable mirror arrays, 792705 (8 February 2011); doi: 10.1117/12.879034
3D Lithography
Proc. SPIE 7927, Advanced fabrication methods for 3D meta-optics, 792706 (8 February 2011); doi: 10.1117/12.877173
Proc. SPIE 7927, A new fabrication method for 3D Si-based photonic crystal structures, 792707 (8 February 2011); doi: 10.1117/12.875111
Proc. SPIE 7927, Selective inhibition of polymerization enables sub-diffraction optical lithography, 792709 (8 February 2011); doi: 10.1117/12.878961
Advanced Lithography
Proc. SPIE 7927, On the evolution of wafer level cameras, 79270A (15 February 2011); doi: 10.1117/12.878574
Proc. SPIE 7927, Fabrication of large-area metal nanoparticle arrays by nanosphere lithography for localized surface plasmon resonance biosensors, 79270B (8 February 2011); doi: 10.1117/12.875427
Laser-based Fabrication
Proc. SPIE 7927, Direct laser writing and applications of dielectric microstructures with low refractive index contrast, 79270F (11 February 2011); doi: 10.1117/12.875951
Proc. SPIE 7927, 2D nanosphere lithography by using surface plasmon-enhanced optical trapping, 79270H (11 February 2011); doi: 10.1117/12.877129
Micro and Nano-optics
Proc. SPIE 7927, Fabrication of singulated micro-retro-reflectors for textured surfaces, 79270J (11 February 2011); doi: 10.1117/12.875352
Proc. SPIE 7927, Freeform micromachining of an infrared Alvarez lens, 79270K (14 February 2011); doi: 10.1117/12.876159
Proc. SPIE 7927, Wafer level glass optics: precision glass molding as an alternative manufacturing approach, 79270L (14 February 2011); doi: 10.1117/12.873169
Proc. SPIE 7927, Manufacturing of cylindrical diffractive lens by ruling, 79270M (14 February 2011); doi: 10.1117/12.872858
Proc. SPIE 7927, Diamond milling or turning for the fabrication of micro lens arrays: comparing different diamond machining technologies, 79270N (14 February 2011); doi: 10.1117/12.874751
Proc. SPIE 7927, Fabrication of single-mode channel waveguides via microfluidics, 79270O (14 February 2011); doi: 10.1117/12.876331
Nanofabrication II: Growth and Deposition
Proc. SPIE 7927, Microfabrication of microsystem-enabled photovoltaic (MEPV) cells, 79270P (14 February 2011); doi: 10.1117/12.876422
Proc. SPIE 7927, Atomic layer epitaxy of TiO2/ZnO multilayer optics using ZnO buffer layer for water-window x-ray, 79270Q (14 February 2011); doi: 10.1117/12.874377
Proc. SPIE 7927, Fabrication of optical filters using multilayered porous silicon, 79270S (14 February 2011); doi: 10.1117/12.873615
Active Optical Device Fabrication
Proc. SPIE 7927, Microscale, printed LEDs for unusual lighting and display systems, 79270T (14 February 2011); doi: 10.1117/12.876573
Proc. SPIE 7927, CMOS-compatible fabrication, micromachining, and bonding strategies for silicon photonics, 79270U (15 February 2011); doi: 10.1117/12.878499
Proc. SPIE 7927, Single quantum dot (QD) manipulation on nanowire using dielectrophoretic (DEP) force, 79270V (14 February 2011); doi: 10.1117/12.873504
Proc. SPIE 7927, DWDM DFB LD fabricated by nanoimprint process, 79270W (14 February 2011); doi: 10.1117/12.876774
Nanofabrication III: Passive Optical Devices
Proc. SPIE 7927, Fabrication of guided mode resonance filters on conformal surfaces, 79270Y (14 February 2011); doi: 10.1117/12.876280
Proc. SPIE 7927, Design and fabrication of a highly off-axis binary multi-phase-level computer-generated hologram based on an effective medium approach, 792710 (14 February 2011); doi: 10.1117/12.875007
Proc. SPIE 7927, Fabrication of multispectral imaging technology driven MEMS-based micro-arrayed multichannel optical filter mosaic, 792711 (14 February 2011); doi: 10.1117/12.875833
Poster Session
Proc. SPIE 7927, Ultrashort pulse induced nonlinear photo-polymerization and phase separation in liquid crystal and monomer mixtures, 792712 (16 March 2011); doi: 10.1117/12.871443
Proc. SPIE 7927, Fabrication of hybrid optical structure by direct machining, 792713 (14 February 2011); doi: 10.1117/12.873528
Proc. SPIE 7927, Laser processing and monitoring of Ag photodoped patterns in GeS2 amorphous films by dual functional laser scanning micro-processing/micro-scope system utilizing UV/VIS confocal laser scanning microscope, 792714 (14 February 2011); doi: 10.1117/12.874310
Proc. SPIE 7927, Hydrogen silsesquioxane (HSQ): a perfect negative tone resist for developing nanostructure patterns on a silicon platform, 792715 (14 February 2011); doi: 10.1117/12.874851
Proc. SPIE 7927, In-depth fiber optic two-photon polymerization and its applications in micromanipulation, 792718 (14 February 2011); doi: 10.1117/12.875876
Proc. SPIE 7927, Bimetallic grayscale photomasks written using optical density feedback control, 792719 (14 February 2011); doi: 10.1117/12.876234
Proc. SPIE 7927, Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature), 79271B (15 February 2011); doi: 10.1117/12.879056
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