PROCEEDINGS VOLUME 7985
27TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE | 18-19 JANUARY 2011
27th European Mask and Lithography Conference
IN THIS VOLUME

0 Sessions, 33 Papers, 0 Presentations
Front Matter  (1)
EUV Mask I  (4)
Metrology  (5)
EUV Mask II  (4)
27TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE
18-19 January 2011
Dresden, Germany
Front Matter
Proc. SPIE 7985, Front Matter: Volume 7985, 798501 (2 April 2011); doi: 10.1117/12.896261
Plenary Session
Proc. SPIE 7985, The 2002 to 2010 mask survey trend analysis, 798502 (17 March 2011); doi: 10.1117/12.896880
E-Beam Patterning
Proc. SPIE 7985, Multiresolution mask writing, 798503 (2 April 2011); doi: 10.1117/12.881929
Proc. SPIE 7985, MSB for ILT masks, 798504 (2 April 2011); doi: 10.1117/12.896883
NGL Lithography and Masks
Proc. SPIE 7985, NGL masks: development status and issue, 798505 (2 April 2011); doi: 10.1117/12.896886
Proc. SPIE 7985, Thermal nanoimprint (T-NIL) with photoresists for hybrid lithography, 798506 (2 April 2011); doi: 10.1117/12.882805
Wafer Patterning and Application
Proc. SPIE 7985, Multilayer reticles: advantages and challenges for 28nm chip making, 798507 (2 April 2011); doi: 10.1117/12.885690
Proc. SPIE 7985, Alignment technology for backside integration, 798508 (2 April 2011); doi: 10.1117/12.882825
EUV Mask I
Proc. SPIE 7985, Using synchrotron light to accelerate EUV resist and mask materials learning, 798509 (2 April 2011); doi: 10.1117/12.885420
Proc. SPIE 7985, EUV mask readiness and challenges for the 22nm half pitch and beyond, 79850A (2 April 2011); doi: 10.1117/12.896913
Proc. SPIE 7985, Actinic EUV-mask metrology: tools, concepts, components, 79850B (2 April 2011); doi: 10.1117/12.896266
Proc. SPIE 7985, EUV actinic mask blank defect inspection: results and status of concept realization, 79850C (2 April 2011); doi: 10.1117/12.896890
Metrology
Proc. SPIE 7985, The evolution of pattern placement metrology for mask making, 79850D (2 April 2011); doi: 10.1117/12.896892
Proc. SPIE 7985, Correlation method based mask to mask overlay metrology for 32nm node and beyond, 79850E (2 April 2011); doi: 10.1117/12.896899
Proc. SPIE 7985, New directions in image placement metrology, 79850F (2 April 2011); doi: 10.1117/12.883771
Proc. SPIE 7985, First steps towards traceability in scatterometry, 79850G (2 April 2011); doi: 10.1117/12.882848
Proc. SPIE 7985, YieldStar: a new metrology platform for advanced lithography control, 79850H (2 April 2011); doi: 10.1117/12.896902
Mask Application
Proc. SPIE 7985, Mask 3D effects: impact on imaging and placement, 79850I (2 April 2011); doi: 10.1117/12.896909
Proc. SPIE 7985, Use of scatterometry for scanner matching, 79850J (2 April 2011); doi: 10.1117/12.886120
Proc. SPIE 7985, Mask tuning for process window improvement, 79850K (2 April 2011); doi: 10.1117/12.896910
Proc. SPIE 7985, Model-based scanner tuning for process optimization, 79850L (2 April 2011); doi: 10.1117/12.882764
Proc. SPIE 7985, Augmented reality for wafer prober, 79850M (2 April 2011); doi: 10.1117/12.882521
Mask Cleaning and Haze
Proc. SPIE 7985, Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, 79850N (2 April 2011); doi: 10.1117/12.896911
Proc. SPIE 7985, Investigation on full 6" masks using innovative solutions for direct physico-chemical analyses of mask contamination and haze, 79850O (2 April 2011); doi: 10.1117/12.891050
Proc. SPIE 7985, Comparison of cleaning processes with respect to cleaning efficiency, 79850P (2 April 2011); doi: 10.1117/12.895198
Proc. SPIE 7985, Minienvironment solutions: special concepts for mask-systems, 79850Q (2 April 2011); doi: 10.1117/12.895200
Data Prep/RET and Simulation
Proc. SPIE 7985, DOE experiment for scattering bars optimization at the 90nm node, 79850R (2 April 2011); doi: 10.1117/12.896341
Proc. SPIE 7985, Geometrically induced dose correction: method and performance results, 79850S (2 April 2011); doi: 10.1117/12.895205
Proc. SPIE 7985, Line end shortening and application of novel correction algorithms in e-beam direct write, 79850T (2 April 2011); doi: 10.1117/12.891127
EUV Mask II
Proc. SPIE 7985, Concept and feasibility of aerial imaging measurements on EUV masks, 79850U (2 April 2011); doi: 10.1117/12.895208
Proc. SPIE 7985, Current status of EUV mask inspection using 193nm optical inspection system in 30nm node and beyond, 79850V (2 April 2011); doi: 10.1117/12.895209
Proc. SPIE 7985, Evidence of printing blank-related defects on EUV masks missed by blank inspection, 79850W (2 April 2011); doi: 10.1117/12.883854
Proc. SPIE 7985, Imaging performance improvements by EUV mask stack optimization, 79850X (2 April 2011); doi: 10.1117/12.884504
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