Damage to VUV, EUV, and X-ray Optics III
Proceedings Volume 8077 is from: Logo
18-21 April 2011
Prague, Czech Republic
Front Matter: Volume 8077
Proc. SPIE 8077, Front Matter: Volume 8077, 807701 (27 May 2011);
Facilities and their Optics
Proc. SPIE 8077, Lifetime and damage threshold properties of reflective x-ray coatings for the LCLS free-electron laser, 807702 (5 May 2011);
Damage by Ultra-Short Pulses I
Proc. SPIE 8077, Modeling of soft x-ray induced ablation in solids, 807705 (19 May 2011);
Thermal Effects of Intense Radiation
Proc. SPIE 8077, Transient analysis of thermal distorsion in a silicon substrate on incidence of a single soft x-ray FEL pulse, 80770A (19 May 2011);
Proc. SPIE 8077, Computer simulation of heat transfer in zone plate optics exposed to x-ray FEL radiation, 80770B (19 May 2011);
Proc. SPIE 8077, Time resolved optical methods for investigation of phase transformations in materials exposed to nanosecond laser pulses, 80770D (19 May 2011);
Proc. SPIE 8077, Thermal analysis experiment to evaluate the stability of multilayer coatings in a space environment close to the sun, 80770E (19 May 2011);
Damage by Plasma Emission
Proc. SPIE 8077, Responses of polymers to laser plasma EUV light beyond ablation threshold and micromachining, 80770F (19 May 2011);
Proc. SPIE 8077, EUV: induced ablation and surface modifications of solids, 80770H (19 May 2011);
Proc. SPIE 8077, Particle-induced damage effects on extreme UV (13.5-nm) source collector mirror optics, 80770I (19 May 2011);
Damage Mechanisms and Characterization
Proc. SPIE 8077, Structural change induced in carbon materials by electronic excitations, 80770J (19 May 2011);
Proc. SPIE 8077, Damage formation and characterization with scanning photoemission spectromicroscopy, 80770K (19 May 2011);
Proc. SPIE 8077, Desorption mechanisms in PMMA irradiated by high order harmonics, 80770L (19 May 2011);
Proc. SPIE 8077, Multilayer white beam study, 80770M (19 May 2011);
Proc. SPIE 8077, Measurement of the point spread function of a soft x-ray microscope by single pixel exposure of photoresists, 80770N (19 May 2011);
Theory and Computation
Proc. SPIE 8077, Electron kinetics in semiconductors and metals irradiated with VUV-XUV femtosecond laser pulses, 80770Q (19 May 2011);
Damage by VUV Radiation
Proc. SPIE 8077, Frenkel defect process in amorphous silica, 80770R (19 May 2011);
Proc. SPIE 8077, Damage to low-k porous organosilicate glass from vacuum-ultraviolet irradiation, 80770S (19 May 2011);
Damage to Filters, Splitters, Phosphors, and Samples
Proc. SPIE 8077, High-throughput beam splitters for high-order harmonics in soft-x-ray region, 80770T (19 May 2011);
Proc. SPIE 8077, Relaxation and interaction of electronic excitations induced by intense ultra short light pulses in BaF[sub]2[/sub] scintillator, 80770U (19 May 2011);
Proc. SPIE 8077, Damage to dry plasmid DNA induced by nanosecond XUV-laser pulses, 80770W (19 May 2011);
Proc. SPIE 8077, Study on the lifetime of Mo/Si multilayer optics with pulsed EUV-source at the ETS, 80770X (19 May 2011);
Poster Session
Proc. SPIE 8077, Thermal stability on Mo/B[sub]4[/sub]C multilayers, 807710 (19 May 2011);
Proc. SPIE 8077, FEL multilayer optics damaged by multiple laser shots: experimental results and discussion, 807711 (19 May 2011);
Proc. SPIE 8077, Handling the carbon contamination issue at SOLEIL, 807712 (19 May 2011);
Proc. SPIE 8077, Blistering behavior in Mo/Si multilayers, 807713 (19 May 2011);
Proc. SPIE 8077, Micromachining of polydimethylsiloxane induced by laser plasma EUV light, 807714 (19 May 2011);
Proc. SPIE 8077, Dynamics of electrons in liquid water excited with an ultrashort VUV laser pulse, 807716 (19 May 2011);
Proc. SPIE 8077, Ablation of ionic crystals induced by capillary-discharge XUV laser, 807719 (23 May 2011);
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