PROCEEDINGS VOLUME 8166
SPIE PHOTOMASK TECHNOLOGY | 19-22 SEPTEMBER 2011
Photomask Technology 2011
Editor Affiliations +
IN THIS VOLUME

36 Sessions, 107 Papers, 0 Presentations, 0 Posters
Proceedings Volume 8166 is from: Logo
SPIE PHOTOMASK TECHNOLOGY
19-22 September 2011
Monterey, California, United States
Front Matter: Volume 8166
Proceedings Volume Photomask Technology 2011, 816601 (2011) https://doi.org/10.1117/12.917331
Invited Session
Proceedings Volume Photomask Technology 2011, 81660D (2011) https://doi.org/10.1117/12.897308
Rik Jonckheere, Dieter Van den Heuvel, Tristan Bret, Thorsten Hofmann, John Magana, Israel Aharonson, Doron Meshulach, Eric Hendrickx, Kurt Ronse
Proceedings Volume Photomask Technology 2011, 81660E (2011) https://doi.org/10.1117/12.901555
EUV Infrastructure and Application I
Patrick P. Naulleau, Kenneth A. Goldberg, Eric Gullikson, Iacopo Mochi, Brittany McClinton, Abbas Rastegar
Proceedings Volume Photomask Technology 2011, 81660F (2011) https://doi.org/10.1117/12.900488
Proceedings Volume Photomask Technology 2011, 81660G (2011) https://doi.org/10.1117/12.898898
Hyuk Joo Kwon, Jenah Harris-Jones, Ranganath Teki, Aaron Cordes, Toshio Nakajima, Iacopo Mochi, Kenneth A. Goldberg, Yuya Yamaguchi, Hiroo Kinoshita
Proceedings Volume Photomask Technology 2011, 81660H (2011) https://doi.org/10.1117/12.897165
Proceedings Volume Photomask Technology 2011, 81660J (2011) https://doi.org/10.1117/12.896981
Mask Business
Proceedings Volume Photomask Technology 2011, 81660K (2011) https://doi.org/10.1117/12.896736
Simulation of Mask Making and Application
Proceedings Volume Photomask Technology 2011, 81660M (2011) https://doi.org/10.1117/12.896416
Thuc Dam, Dongxue Chen, Hsien-Min Chang, Noel Corcoran, Paul Yu, Linyong Pang, Chia-Wei Chang, Rick Lai, Peter Chang, et al.
Proceedings Volume Photomask Technology 2011, 81660O (2011) https://doi.org/10.1117/12.896951
R. Galler, M. Krueger, D. Melzer, L. E. Ramos, M. Suelzle, U. Weidenmueller
Proceedings Volume Photomask Technology 2011, 81660P (2011) https://doi.org/10.1117/12.896759
Mask Data Preparation and Process Correction
Proceedings Volume Photomask Technology 2011, 81660Q (2011) https://doi.org/10.1117/12.899591
Dan Hung, Domingo Morales, Juan Pablo Canepa, Stephen Kim, Po Liu, Jean-Paul Sier, Patrick LoPresti
Proceedings Volume Photomask Technology 2011, 81660R (2011) https://doi.org/10.1117/12.896964
Proceedings Volume Photomask Technology 2011, 81660S (2011) https://doi.org/10.1117/12.898853
Proceedings Volume Photomask Technology 2011, 81660T (2011) https://doi.org/10.1117/12.897779
Proceedings Volume Photomask Technology 2011, 81660U (2011) https://doi.org/10.1117/12.897051
Design for Manufacturability, and Optical Enhancements: SMO, OPC etc. I
Te-Hung Wu, Robert Sinn, Bob Gleason, JongDoo Kim, Jiyoung Hong, Sejin Park, Sukjoo Lee
Proceedings Volume Photomask Technology 2011, 81660V (2011) https://doi.org/10.1117/12.896503
Proceedings Volume Photomask Technology 2011, 81660W (2011) https://doi.org/10.1117/12.898899
David Abercrombie, Pat Lacour, Omar El-Sewefy, Alex Volkov, Evgueni Levine, Kellen Arb, Chris Reid, Qiao Li, Pradiptya Ghosh
Proceedings Volume Photomask Technology 2011, 81660X (2011) https://doi.org/10.1117/12.898895
Jae-hoon Jeong, Sei-ryung Choi, Seung-hyun Chang, Myoung-seob Shim, Gyoyoung Jin
Proceedings Volume Photomask Technology 2011, 81660Y (2011) https://doi.org/10.1117/12.896129
EUV Infrastructure and Application II
Frank A. J. M. Driessen, Natalia Davydova, J. Jiang, H. Kang, V. Vaenkatesan, D. Oorschot, I. S. Kim, S. N. Kang, Y. Lee, et al.
Proceedings Volume Photomask Technology 2011, 81660Z (2011) https://doi.org/10.1117/12.898955
Proceedings Volume Photomask Technology 2011, 816610 (2011) https://doi.org/10.1117/12.899038
Proceedings Volume Photomask Technology 2011, 816611 (2011) https://doi.org/10.1117/12.896996
Shmoolik Mangan, C. C. Lin, Greg Hughes, Ran Brikman, Alex Goldenshtein, Vladislav Kudriashov, Alon Litman, Lior Shoval, Ilan Englard
Proceedings Volume Photomask Technology 2011, 816612 (2012) https://doi.org/10.1117/12.899067
Mask Cleaning, Contamination, Haze, and Prevention I
Hyemi Lee, JeaYoung Jun, GooMin Jeong, SangChul Kim, SangPyo Kim, ChangReol Kim
Proceedings Volume Photomask Technology 2011, 816613 (2011) https://doi.org/10.1117/12.898975
Hrishi Shende, Sherjang Singh, James Baugh, Raunak Mann, Uwe Dietze, Peter Dress
Proceedings Volume Photomask Technology 2011, 816614 (2011) https://doi.org/10.1117/12.898409
Proceedings Volume Photomask Technology 2011, 816615 (2011) https://doi.org/10.1117/12.896962
Mask Processes, Substrates, and Materials I
Andrew Jamieson, Yong Kwan Kim, Bennett Olson, Maiying Lu, Nathan Wilcox
Proceedings Volume Photomask Technology 2011, 816616 (2011) https://doi.org/10.1117/12.898901
Proceedings Volume Photomask Technology 2011, 816617 (2011) https://doi.org/10.1117/12.898889
Proceedings Volume Photomask Technology 2011, 816618 (2011) https://doi.org/10.1117/12.895149
Proceedings Volume Photomask Technology 2011, 816619 (2011) https://doi.org/10.1117/12.898892
Mask Pattern Generation I
Proceedings Volume Photomask Technology 2011, 81661B (2011) https://doi.org/10.1117/12.896977
Proceedings Volume Photomask Technology 2011, 81661C (2011) https://doi.org/10.1117/12.898755
Proceedings Volume Photomask Technology 2011, 81661D (2011) https://doi.org/10.1117/12.898850
Mask Metrology I
D. Seidel, M. Arnz, D. Beyer
Proceedings Volume Photomask Technology 2011, 81661E (2011) https://doi.org/10.1117/12.896592
M. Ferber, F. Laske, K.-D. Röth, D. Adam
Proceedings Volume Photomask Technology 2011, 81661F (2011) https://doi.org/10.1117/12.896850
Mask Inspection and Repair I
Proceedings Volume Photomask Technology 2011, 81661G (2011) https://doi.org/10.1117/12.898864
Jihoon Na, Wonil Cho, Tae-Geun Kim, In-Yong Kang, Byungcheol Cha, Inkyun Shin, Han-Ku Cho
Proceedings Volume Photomask Technology 2011, 81661H (2011) https://doi.org/10.1117/12.898896
Lin He, Noel Corcoran, Danping Peng, Vikram Tolani, Hsien-Min Chang, Paul Yu, Kechang Wang, C. J. Chen, T. H. Yen, et al.
Proceedings Volume Photomask Technology 2011, 81661I (2011) https://doi.org/10.1117/12.896948
Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, David Lee
Proceedings Volume Photomask Technology 2011, 81661J (2011) https://doi.org/10.1117/12.898503
Mask Cleaning, Contamination, Haze, and Prevention II
Proceedings Volume Photomask Technology 2011, 81661K (2011) https://doi.org/10.1117/12.899055
Young-Jin An, Jong-Min Kim, Byung-Sun Kang, Dong-Heok Lee, Sang-Soo Choi
Proceedings Volume Photomask Technology 2011, 81661L (2011) https://doi.org/10.1117/12.896776
Jaehyuck Choi, Han-shin Lee, Jinsang Yoon, Takeya Shimomura, Alex Friz, Cecilia Montgomery, Andy Ma, Frank Goodwin, Daehyuk Kang, et al.
Proceedings Volume Photomask Technology 2011, 81661M (2011) https://doi.org/10.1117/12.896836
Takeya Shimomura, Abbas Rastegar
Proceedings Volume Photomask Technology 2011, 81661N (2011) https://doi.org/10.1117/12.898576
Robert J. Chen, Brittany M. McClinton, Simi A. George, Yongbae Kim, Lorie-Mae Baclea-an, Patrick P. Naulleau
Proceedings Volume Photomask Technology 2011, 81661O (2011) https://doi.org/10.1117/12.896975
Mask Metrology II
Frank Scholze, Akiko Kato, Jan Wernecke, Michael Krumrey
Proceedings Volume Photomask Technology 2011, 81661P (2011) https://doi.org/10.1117/12.896847
Proceedings Volume Photomask Technology 2011, 81661Q (2011) https://doi.org/10.1117/12.896839
Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, et al.
Proceedings Volume Photomask Technology 2011, 81661R (2011) https://doi.org/10.1117/12.896982
Proceedings Volume Photomask Technology 2011, 81661S (2011) https://doi.org/10.1117/12.898843
NIL Infrastructure and Application I
Duhyun Lee, Byung-Kyu Lee, Woong Ko, Jae-Kwan Kim, Kiyeon Yang, Byounghoon Seung, Ilyong Jang, Mun Ja Kim, Byunggook Kim, et al.
Proceedings Volume Photomask Technology 2011, 81661U (2011) https://doi.org/10.1117/12.898747
Naotoshi Sato, Tadashi Oomatsu, Satoshi Wakamatsu, Katsuhiro Nishimaki, Toshihiro Usa, Kunihiko Kodama, Kazuyuki Usuki
Proceedings Volume Photomask Technology 2011, 81661V (2011) https://doi.org/10.1117/12.896504
Mask Processes, Substrates, and Materials II
John Whang, Madhavi Chandrachood, Emily Gallagher, Tom Faure, Michael Grimbergen, Shaun Crawford, Keven Yu, T. Y .B Leung, Richard Wistrom, et al.
Proceedings Volume Photomask Technology 2011, 81661W (2011) https://doi.org/10.1117/12.898815
Proceedings Volume Photomask Technology 2011, 81661Y (2011) https://doi.org/10.1117/12.898295
Mask Pattern Generation II
Proceedings Volume Photomask Technology 2011, 81661Z (2011) https://doi.org/10.1117/12.898856
Hiroshi Matsumoto, Yasuo Kato, Tomoo Motosugi, Jun Yashima, Takayuki Abe, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori
Proceedings Volume Photomask Technology 2011, 816620 (2011) https://doi.org/10.1117/12.898846
New Mask Making and Alternatives I
Proceedings Volume Photomask Technology 2011, 816621 (2011) https://doi.org/10.1117/12.897586
Elmar Platzgummer, Christof Klein, Hans Loeschner
Proceedings Volume Photomask Technology 2011, 816622 (2011) https://doi.org/10.1117/12.895523
Masaki Kurokawa, Hideaki Isobe, Masahiro Takizawa, Keita Bunya, Hideaki Komami, Akio Yamada, Kazuhiko Shiomitsu, Kazuto Oonou
Proceedings Volume Photomask Technology 2011, 816623 (2011) https://doi.org/10.1117/12.896781
Natalia Davydova, Eelco van Setten, Sang-In Han, Mark van de Kerkhof, Robert de Kruif, Dorothe Oorschot, John Zimmerman, Ad Lammers, Brid Connolly, et al.
Proceedings Volume Photomask Technology 2011, 816624 (2011) https://doi.org/10.1117/12.896816
NIL Infrastructure and Application II
J. Lille, K. Patel, R. Ruiz, T.-W. Wu, H. Gao, Lei Wan, G. Zeltzer, E. Dobisz, T. R. Albrecht
Proceedings Volume Photomask Technology 2011, 816626 (2011) https://doi.org/10.1117/12.898785
Kosta S. Selinidis, Chris Jones, Gary F. Doyle, Laura Brown, Joseph Imhof, Dwayne L. LaBrake, Douglas J. Resnick, S. V. Sreenivasan
Proceedings Volume Photomask Technology 2011, 816627 (2011) https://doi.org/10.1117/12.898865
Design for Manufacturability, and Optical Enhancements: SMO, OPC etc. II
Thuc Dam, Robert Sinn, Paul Rissman, Bob Gleason
Proceedings Volume Photomask Technology 2011, 816629 (2011) https://doi.org/10.1117/12.896963
Kazuya Iwase, Peter De Bisschop, Bart Laenens, Zhipan Li, Keith Gronlund, Paul van Adrichem, Stephen Hsu
Proceedings Volume Photomask Technology 2011, 81662A (2011) https://doi.org/10.1117/12.898749
New Mask Making and Alternatives II
Florian Letzkus, Tarek Zaki, Frederik Ante, Harald Richter, Joachim N. Burghartz, Jörg Butschke, Hagen Klauck
Proceedings Volume Photomask Technology 2011, 81662B (2011) https://doi.org/10.1117/12.899168
Dan Hung, Otto Meijer, Alex Zepka
Proceedings Volume Photomask Technology 2011, 81662C (2011) https://doi.org/10.1117/12.896954
Mask Inspection and Repair II
Eric Guo, Irene Shi, Blade Gao, Nancy Fan, Guojie Cheng, Li Ling, Ke Zhou, Gary Zhang, Ye Chen, et al.
Proceedings Volume Photomask Technology 2011, 81662D (2011) https://doi.org/10.1117/12.896879
Linyong Pang, Peter Hu, Masaki Satake, Vikram Tolani, Danping Peng, Ying Li, Dongxue Chen
Proceedings Volume Photomask Technology 2011, 81662E (2011) https://doi.org/10.1117/12.897215
Shinji Yamaguchi, Masato Naka, Takashi Hirano, Masamitsu Itoh, Motoki Kadowaki, Tooru Koike, Yuichiro Yamazaki, Kenji Terao, Masahiro Hatakeyama, et al.
Proceedings Volume Photomask Technology 2011, 81662F (2011) https://doi.org/10.1117/12.898790
Special Session: Is it too late to panic? EUV is Real!
Proceedings Volume Photomask Technology 2011, 81662I (2011) https://doi.org/10.1117/12.901602
Poster Session: Mask Business
Guoxiang Ning, Byoung Il Choi, Christian Holfeld, Yee Ta Ngow, Sia Kim Tan, Anna Tchikoulaeva, Fang Hong Gn
Proceedings Volume Photomask Technology 2011, 81662N (2011) https://doi.org/10.1117/12.898801
Poster Session: Mask Cleaning, Contamination, Haze, and Prevention
Proceedings Volume Photomask Technology 2011, 81662P (2011) https://doi.org/10.1117/12.898649
Tsutomu Kikuchi, Yuji Nagashima, Haruka Nakano, Takahiko Wakatsuki, Kensuke Demura, Yoshiaki Kurokawa, Mikio Nonaka
Proceedings Volume Photomask Technology 2011, 81662Q (2011) https://doi.org/10.1117/12.899281
Poster Session: EUV Infrastructure and Application
Proceedings Volume Photomask Technology 2011, 81662S (2011) https://doi.org/10.1117/12.896908
Proceedings Volume Photomask Technology 2011, 81662T (2011) https://doi.org/10.1117/12.898857
Deborah Gustafson, Stephen F. Horne, Matthew J. Partlow, Matthew M. Besen, Donald K. Smith, Paul A. Blackborow
Proceedings Volume Photomask Technology 2011, 81662U (2011) https://doi.org/10.1117/12.899141
Poster Session: Mask Inspection and Repair
Ernesto Villa, Luca Sartelli, Hiroyuki Miyashita
Proceedings Volume Photomask Technology 2011, 81662V (2011) https://doi.org/10.1117/12.896570
Keizo Yamada, Yasunobu Kitayama, Peter Fiekowsky
Proceedings Volume Photomask Technology 2011, 81662W (2011) https://doi.org/10.1117/12.896971
Jin-Hong Lin, C. Y. Chen, F. G. Tsai, Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta
Proceedings Volume Photomask Technology 2011, 81662X (2011) https://doi.org/10.1117/12.898502
Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, Bernie Arruza
Proceedings Volume Photomask Technology 2011, 81662Y (2011) https://doi.org/10.1117/12.898504
Mark Pereira, Manabendra Maji, Budde Gangadhar, Ravi R. Pai, Ila Nigam, Anil Parchuri
Proceedings Volume Photomask Technology 2011, 81662Z (2011) https://doi.org/10.1117/12.898793
Shmoolik Mangan, C. C. Lin, Greg Hughes, Ran Brikman, Alex Goldenshtein, Vlad Kudriashov, Alon Litman, Lior Shoval, Ilan Englard
Proceedings Volume Photomask Technology 2011, 816631 (2012) https://doi.org/10.1117/12.898854
Poster Session: Mask Data Preparation and Process Correction
Gek Soon Chua, Wei Long Wang, Byoung IL Choi, Yi Zou, Cyrus Tabery, Ingo Bork, Tam Nguyen, Aki Fujimura
Proceedings Volume Photomask Technology 2011, 816632 (2011) https://doi.org/10.1117/12.897037
Proceedings Volume Photomask Technology 2011, 816634 (2011) https://doi.org/10.1117/12.902443
Poster Session: Mask Metrology
Shuichi Tamamushi, Takanao Touya
Proceedings Volume Photomask Technology 2011, 816639 (2011) https://doi.org/10.1117/12.898890
Wei Cyuan Lo, Yung Feng Cheng, Ming Jui Chen, Katsuhiro Takushima, Shinichiroh Tashiro
Proceedings Volume Photomask Technology 2011, 81663A (2011) https://doi.org/10.1117/12.900280
Poster Session: NIL Infrastructure and Application
Kouta Suzuki, Hideo Kobayashi, Takashi Sato, Hiroshi Yamashita, Tsuyoshi Watanabe
Proceedings Volume Photomask Technology 2011, 81663B (2011) https://doi.org/10.1117/12.897099
Poster Session: Design for Manufacturability, and Optical Enhancements: SMO, RET, OPC, etc.
Chun-Wei Wu, Chun-Cheng Liao, Chiang-Lin Shih, Chung-Hsing Chang, Stephen Hsu, Hua-Yu Liu, Zhipan Li
Proceedings Volume Photomask Technology 2011, 81663C (2011) https://doi.org/10.1117/12.896978
Coumba Ndoye, Marius Orlowski
Proceedings Volume Photomask Technology 2011, 81663D (2011) https://doi.org/10.1117/12.895146
Proceedings Volume Photomask Technology 2011, 81663E (2011) https://doi.org/10.1117/12.896990
Francois Weisbuch, Jessy Schramm
Proceedings Volume Photomask Technology 2011, 81663G (2011) https://doi.org/10.1117/12.897126
Proceedings Volume Photomask Technology 2011, 81663H (2011) https://doi.org/10.1117/12.898617
Ahmed Omran, Jochen Schacht, Jully Pan, Junjiang Lei, Le Hong, Mohamed Al-Imam, Nick Cobb, Regina Shen, Ryan Chou
Proceedings Volume Photomask Technology 2011, 81663I (2011) https://doi.org/10.1117/12.896677
Lionel Ravel, Christophe Brault, Chloé Hegaret, Antonio Di Giacomo, Romain Lallement, Jérôme Azémar, Marie Hellion
Proceedings Volume Photomask Technology 2011, 81663J (2011) https://doi.org/10.1117/12.896827
Proceedings Volume Photomask Technology 2011, 81663M (2011) https://doi.org/10.1117/12.898860
Tuck Boon Chan, Kwangok Jeong, Andrew B. Kahng
Proceedings Volume Photomask Technology 2011, 81663O (2011) https://doi.org/10.1117/12.899553
Makoto Miyagi, Peter Brooker, Chander Sawh, Travis Brist, Kunal Taravade
Proceedings Volume Photomask Technology 2011, 81663P (2011) https://doi.org/10.1117/12.900609
Thuc Dam, Robert Gleason, Paul Rissman, Robert Sinn
Proceedings Volume Photomask Technology 2011, 81663Q (2011) https://doi.org/10.1117/12.900852
Amr Abdo, Ramya Viswanathan
Proceedings Volume Photomask Technology 2011, 81663R (2011) https://doi.org/10.1117/12.901125
Poster Session: Mask Processes, Substrates, and Materials
Yusuke Hirabayashi
Proceedings Volume Photomask Technology 2011, 81663T (2011) https://doi.org/10.1117/12.897266
Proceedings Volume Photomask Technology 2011, 81663U (2011) https://doi.org/10.1117/12.898912
Taichi Yamazaki, Ryohei Gorai, Yosuke Kojima, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa
Proceedings Volume Photomask Technology 2011, 81663V (2011) https://doi.org/10.1117/12.898984
Yoshinori Iino, Makoto Karyu, Hirotsugu Ita, Tomoaki Yoshimori, Hidehito Azumano, Makoto Muto, Mikio Nonaka
Proceedings Volume Photomask Technology 2011, 81663W (2011) https://doi.org/10.1117/12.898976