PROCEEDINGS VOLUME 8168
SPIE OPTICAL SYSTEMS DESIGN | 5-8 SEPTEMBER 2011
Advances in Optical Thin Films IV
Proceedings Volume 8168 is from: Logo
SPIE OPTICAL SYSTEMS DESIGN
5-8 September 2011
Marseille, France
Front Matter
Proc. SPIE 8168, Front Matter: Volume 8168, 816801 (26 October 2011); doi: 10.1117/12.916797
Opening Session
Proc. SPIE 8168, Progress in optical coatings, 816802 (16 September 2011); doi: 10.1117/12.902316
Antireflective Coatings
Proc. SPIE 8168, Ultra-low-reflectance, high-uniformity, multilayer-antireflection coatings on large substrates deposited using an ion-beam sputtering system with a customized planetary rotation stage, 816803 (4 October 2011); doi: 10.1117/12.896747
Proc. SPIE 8168, Protective infrared antireflection coating based on sputtered germanium carbide, 816804 (4 October 2011); doi: 10.1117/12.896686
Coating Design and Analysis
Proc. SPIE 8168, Optimal design for field enhancement in optical coatings, 816808 (5 October 2011); doi: 10.1117/12.902317
Proc. SPIE 8168, Design of multilayer coatings containing metal island films, 816809 (4 October 2011); doi: 10.1117/12.896181
Proc. SPIE 8168, Investigation of manufacturing processes by numerical sensitivity analysis, 81680A (4 October 2011); doi: 10.1117/12.896785
Proc. SPIE 8168, Application of global optimization algorithms for optical thin film index determination from spectro-photometric analysis, 81680B (5 October 2011); doi: 10.1117/12.896832
Proc. SPIE 8168, Effect of substrate index of refraction on the design of antireflection coatings, 81680C (4 October 2011); doi: 10.1117/12.898517
Proc. SPIE 8168, Angular and spectral light scattering from complex multidielectric coatings, 81680D (4 October 2011); doi: 10.1117/12.897893
Proc. SPIE 8168, Robust synthesis of dispersive mirrors, 81680E (5 October 2011); doi: 10.1117/12.896527
Applications
Proc. SPIE 8168, Optical coatings in space, 81680F (5 October 2011); doi: 10.1117/12.902318
Proc. SPIE 8168, Colour control and selectivity in TiAlN solar-thermal absorbers, 81680G (5 October 2011); doi: 10.1117/12.896591
Proc. SPIE 8168, Research on low-polarizing x-plate for LED projector using green phosphors, 81680H (5 October 2011); doi: 10.1117/12.896812
Proc. SPIE 8168, Coatings for thin-disk laser systems, 81680J (4 October 2011); doi: 10.1117/12.897000
Deposition Processes
Proc. SPIE 8168, Atomic layer deposition of iridium thin films and their application in gold electrodeposition, 81680K (4 October 2011); doi: 10.1117/12.896818
Proc. SPIE 8168, Plasma and optical thin film technologies, 81680L (5 October 2011); doi: 10.1117/12.895323
Proc. SPIE 8168, Optical and thin film properties of mixed oxides deposited by pulsed reactive magnetron sputtering, 81680N (4 October 2011); doi: 10.1117/12.896838
Proc. SPIE 8168, New sputtering concept for optical precision coatings, 81680O (4 October 2011); doi: 10.1117/12.896843
Proc. SPIE 8168, PACA2M: magnetron sputtering for 2-meter optics, 81680P (4 October 2011); doi: 10.1117/12.897884
Thin-film Materials
Proc. SPIE 8168, Organic small molecule-based optical coatings, 81680Q (4 October 2011); doi: 10.1117/12.896793
Proc. SPIE 8168, Tailored TCOs, 81680R (4 October 2011); doi: 10.1117/12.896774
Proc. SPIE 8168, Spectral density analysis of the optical properties of Ni-Al2O3 nano-composite films, 81680S (4 October 2011); doi: 10.1117/12.898174
Proc. SPIE 8168, Organic materials for the use in optical layer systems, 81680T (4 October 2011); doi: 10.1117/12.896800
Filters and Manufacturing
Proc. SPIE 8168, IRDIS filters: from design to qualification, 81680X (4 October 2011); doi: 10.1117/12.897224
Proc. SPIE 8168, Exclusive examples of high-performance thin-film optical filters for fluorescence spectroscopy made by plasma-assisted reactive magnetron sputtering, 81680Y (4 October 2011); doi: 10.1117/12.896846
Proc. SPIE 8168, Manufacturing and characterizing of all-dielectric band-pass filters for the short-wave infrared region, 81680Z (4 October 2011); doi: 10.1117/12.896869
Proc. SPIE 8168, Infrared polarizing beam-splitters for the 7 to 13 um spectral region, 816811 (4 October 2011); doi: 10.1117/12.896940
Characterization
Proc. SPIE 8168, Optical performance of narrow-band transmittance filters under low-and high-energy proton irradiation, 816814 (4 October 2011); doi: 10.1117/12.896517
Proc. SPIE 8168, Study of the laser matter interaction in the femtosecond regime: application to the analysis of the laser damage of optical thin films, 816815 (5 October 2011); doi: 10.1117/12.897372
Proc. SPIE 8168, Using monodisperse SiO2 microspheres to study laser-induced damage of nodules in HfO2/SiO2 high reflectors, 816816 (5 October 2011); doi: 10.1117/12.896733
Soft X-ray/EUV/DUV/VUV Coatings
Proc. SPIE 8168, Design, deposition, and characterization of multilayer mirrors for ultrashort pulses in the attosecond domain, 816817 (4 October 2011); doi: 10.1117/12.902320
Proc. SPIE 8168, Optical, chemical, depth, and magnetic characterization of Mg/Co-based nanometric periodic multilayers, 816818 (5 October 2011); doi: 10.1117/12.895316
Proc. SPIE 8168, EUV reflectivity and stability of tri-component Al-based multilayers, 816819 (4 October 2011); doi: 10.1117/12.896577
Proc. SPIE 8168, Coating development for the far and extreme ultraviolet based on material characterization, 81681B (4 October 2011); doi: 10.1117/12.896842
Proc. SPIE 8168, Mg-based multilayers and their thermal stabilities for EUV range, 81681C (5 October 2011); doi: 10.1117/12.896405
Process Control and Monitoring
Proc. SPIE 8168, Broadband monitoring simulation with massively parallel processors, 81681D (4 October 2011); doi: 10.1117/12.896522
Proc. SPIE 8168, Online re-optimization as a powerful part of enhanced strategies in optical broadband monitoring, 81681E (4 October 2011); doi: 10.1117/12.898557
Proc. SPIE 8168, From independent thickness monitoring to adaptive manufacturing: advanced deposition control of complex optical coatings, 81681F (4 October 2011); doi: 10.1117/12.898598
Proc. SPIE 8168, Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine, 81681G (4 October 2011); doi: 10.1117/12.898609
Proc. SPIE 8168, Optimization of ion-assisted ITO films by design of experiment, 81681H (4 October 2011); doi: 10.1117/12.896398
Proc. SPIE 8168, Modelling and optimization of film thickness variation for plasma enhanced chemical vapour deposition processes, 81681I (4 October 2011); doi: 10.1117/12.896696
Proc. SPIE 8168, Testglass changer for direct optical monitoring, 81681J (5 October 2011); doi: 10.1117/12.896859
1D Photonic Crystals and Metamaterials
Proc. SPIE 8168, Photothermal phenomena in plasmonics and metamaterials, 81681K (5 October 2011); doi: 10.1117/12.902321
Proc. SPIE 8168, Enhancement of omnidirectional bandgaps by one-dimensional ternary photonic crystals, 81681L (4 October 2011); doi: 10.1117/12.896441
Proc. SPIE 8168, Re-definition of effective refractive index of thin film buried quantum dots, 81681M (5 October 2011); doi: 10.1117/12.896766
Proc. SPIE 8168, Nanostructures versus thin films in the design of antireflection coatings, 81681N (4 October 2011); doi: 10.1117/12.896841
Proc. SPIE 8168, Two waves interaction in layered photonic structure at big phase mismatching, 81681P (4 October 2011); doi: 10.1117/12.897803
Poster Session
Proc. SPIE 8168, Thickness uniformity improvement for the twin mirrors used in advanced gravitational wave detectors, 81681Q (4 October 2011); doi: 10.1117/12.896318
Proc. SPIE 8168, Aluminum based multilayers systems synthesized by ion beam sputtering for extreme UV, 81681S (5 October 2011); doi: 10.1117/12.896433
Proc. SPIE 8168, Energy logistics in an all-optical adder based on a 1D porous silicon photonic crystal, 81681U (4 October 2011); doi: 10.1117/12.896728
Proc. SPIE 8168, Interface plasmonic properties of silver coated by ultrathin metal oxides, 81681V (4 October 2011); doi: 10.1117/12.896769
Proc. SPIE 8168, Optical and mechanical properties of oxide UV coatings, prepared by PVD techniques, 81681W (4 October 2011); doi: 10.1117/12.896775
Proc. SPIE 8168, Band-pass and OH-suppression filters for the E-ELT: design and prototyping, 81681Y (4 October 2011); doi: 10.1117/12.896916
Proc. SPIE 8168, Investigation of the optical property and structure of WO3 thin films with different sputtering depositions, 81681Z (4 October 2011); doi: 10.1117/12.897017
Proc. SPIE 8168, Residual stress analysis for oxide thin film deposition on flexible substrate using finite element method, 816820 (4 October 2011); doi: 10.1117/12.897021
Proc. SPIE 8168, Laser-induced damage of pure and mixture material high reflectors for 355nm and 1064nm wavelength, 816821 (4 October 2011); doi: 10.1117/12.897049