PROCEEDINGS VOLUME 8171
SPIE OPTICAL SYSTEMS DESIGN | 5-8 SEPTEMBER 2011
Physical Optics
IN THIS VOLUME

0 Sessions, 22 Papers, 0 Presentations
Front Matter  (1)
Proceedings Volume 8171 is from: Logo
SPIE OPTICAL SYSTEMS DESIGN
5-8 September 2011
Marseille, France
Front Matter
Proc. SPIE 8171, Front Matter: Volume 8171, 817101 (24 October 2011); doi: 10.1117/12.916823
Polarization and Coherence I
Proc. SPIE 8171, Temporal and spectral degrees of polarization of light, 817102 (5 October 2011); doi: 10.1117/12.896894
Proc. SPIE 8171, Random media confer high polarization degree to unpolarized light, 817103 (5 October 2011); doi: 10.1117/12.896731
Proc. SPIE 8171, Evolution of vortex density in a non-diffracting speckle field with its continuous phase removed, 817104 (16 September 2011); doi: 10.1117/12.896820
Proc. SPIE 8171, Electromagnetic Hanbury Brown-Twiss phenomenon, 817105 (5 October 2011); doi: 10.1117/12.897119
Proc. SPIE 8171, Further discussion of Huygens-Fresnel principle, 817106 (5 October 2011); doi: 10.1117/12.899036
Proc. SPIE 8171, Physical property of structural color in butterflies, 817107 (5 October 2011); doi: 10.1117/12.896857
Polarization and Coherence II
Proc. SPIE 8171, About the nature of the coherence of light waves, 817108 (5 October 2011); doi: 10.1117/12.895285
Proc. SPIE 8171, Polarization modeling in square ring resonators with the consideration of output mirror's stress effect, 81710A (5 October 2011); doi: 10.1117/12.896326
Polarization and Coherence III
Proc. SPIE 8171, The Minimum Spanning Tree method applied to the study of optical speckle fields: spatial characterization of a Gaussian transition and its phase singularities, 81710B (5 October 2011); doi: 10.1117/12.896569
Proc. SPIE 8171, Multiscale spatial depolarization of light: electromagnetism and statistical optics, 81710C (5 October 2011); doi: 10.1117/12.896726
Beam Propagation
Proc. SPIE 8171, Tests for assessing beam propagation algorithms, 81710E (5 October 2011); doi: 10.1117/12.896933
Proc. SPIE 8171, Efficient use of grating theories with partially coherent illumination, 81710F (5 October 2011); doi: 10.1117/12.896805
Proc. SPIE 8171, Gaussian beam mode analysis of optical pulses, 81710H (5 October 2011); doi: 10.1117/12.896723
Topics in Microlithography
Proc. SPIE 8171, Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing, 81710K (5 October 2011); doi: 10.1117/12.896755
Proc. SPIE 8171, Illumination pupilgram prediction and control method in advanced optical lithography, 81710L (5 October 2011); doi: 10.1117/12.899032
Proc. SPIE 8171, Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects, 81710M (5 October 2011); doi: 10.1117/12.896813
Proc. SPIE 8171, Analytical model for EUV mask diffraction field calculation, 81710N (5 October 2011); doi: 10.1117/12.896579
Proc. SPIE 8171, Influence of geometry variations and defects on the near-field optical properties of pulsed compression gratings, 81710O (5 October 2011); doi: 10.1117/12.897335
Poster Session
Proc. SPIE 8171, Higher-order ghost imaging with partially polarized classical light, 81710Q (5 October 2011); doi: 10.1117/12.896826
Proc. SPIE 8171, Corrected coupled-wave theory for non-slanted reflection gratings, 81710R (5 October 2011); doi: 10.1117/12.896877
Proc. SPIE 8171, Self-disappearance of the frequency doubling of light in germanium-silicate patterns, 81710S (5 October 2011); doi: 10.1117/12.897019
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