Proceedings Volume 8190 is from: Logo
SPIE LASER DAMAGE
18-21 September 2011
Boulder, Colorado, United States
Front Matter
Proc. SPIE 8190, Front Matter: Volume 8190, 819001 (27 December 2011); doi: 10.1117/12.920412
Thin Films I
Proc. SPIE 8190, Using engineered defects to study laser-induced damage in optical thin films with nanosecond pulses, 819002 (23 November 2011); doi: 10.1117/12.889262
Proc. SPIE 8190, Low loss ion beam sputtered optical coatings and their applications, 819003 (23 November 2011); doi: 10.1117/12.903634
Thin Films II
Proc. SPIE 8190, Measurement and calculation of ternary oxide mixtures for thin films for ultra short pulse laser optics, 819004 (23 November 2011); doi: 10.1117/12.899566
Proc. SPIE 8190, HfO2/SiO2 enhanced diamond turned aluminum mirrors for IR laser optics, 819005 (6 December 2011); doi: 10.1117/12.900226
Proc. SPIE 8190, Laser damage threshold results for sputtered coatings produced using different deposition technologies, 819006 (23 November 2011); doi: 10.1117/12.899118
Proc. SPIE 8190, Excimer mirror thin film laser damage competition, 819007 (6 December 2011); doi: 10.1117/12.899187
Thin Films III
Proc. SPIE 8190, Laser-induced damage of coatings on Yb:YAG crystals at cryogenic condition, 819008 (23 November 2011); doi: 10.1117/12.899105
Proc. SPIE 8190, Laser-induced damage of Kapton thin films demonstrating temperature and wavelength dependent absorptance: a case study in remote-sensing material analysis, 819009 (23 November 2011); doi: 10.1117/12.899248
Proc. SPIE 8190, Laser-induced damage thresholds of optical coatings at different temperature, 81900A (23 November 2011); doi: 10.1117/12.899033
Proc. SPIE 8190, Investigation of the laser-induced damage of dispersive coatings, 81900B (23 November 2011); doi: 10.1117/12.899116
Proc. SPIE 8190, Characterization of 1064nm laser-induced damage on antireflection coatings grown by atomic layer deposition, 81900C (23 November 2011); doi: 10.1117/12.899053
Poster Session: Thin Films
Proc. SPIE 8190, Defect formation in oxide thin films, 81900D (23 November 2011); doi: 10.1117/12.899113
Proc. SPIE 8190, Spontaneous and induced absorption in amorphous Ta2O5 dielectric thin films, 81900F (6 December 2011); doi: 10.1117/12.899217
Proc. SPIE 8190, Database on damage thresholds of picoseconds pulse for HR coatings, 81900I (23 November 2011); doi: 10.1117/12.899275
Proc. SPIE 8190, Characterization of hafnia thin films made with different deposition technologies, 81900J (23 November 2011); doi: 10.1117/12.904251
Materials and Measurements I
Proc. SPIE 8190, Subnanosecond bulk damage thresholds of single-crystal YAG and diffusion-bonded YAG structures at 1 micron, 81900M (23 November 2011); doi: 10.1117/12.899148
Materials and Measurements II
Proc. SPIE 8190, Imaging studies of photodamage and recovery of anthraquinone derivatives doped into PMMA, 81900N (23 November 2011); doi: 10.1117/12.896369
Proc. SPIE 8190, Recent progress in the development of pulse compression gratings, 81900O (23 November 2011); doi: 10.1117/12.897711
Proc. SPIE 8190, Recent progress in reversible photodegradation of Disperse Orange 11 when doped in PMMA, 81900P (23 November 2011); doi: 10.1117/12.899102
Proc. SPIE 8190, Optical coatings on laser crystals for HiPER project, 81900Q (23 November 2011); doi: 10.1117/12.899181
Proc. SPIE 8190, Femtosecond laser microfabrication in polymers towards memory devices and microfluidic applications, 81900R (23 November 2011); doi: 10.1117/12.899175
Materials and Measurements III
Proc. SPIE 8190, Estimation of the transverse stimulated Raman scattering gain coefficient in KDP and DKDP at 2-omega, 3-omega, and 4-omega, 81900S (23 November 2011); doi: 10.1117/12.899266
Proc. SPIE 8190, Third harmonic microscopy for optical material characterization, 81900V (23 November 2011); doi: 10.1117/12.899265
Materials and Measurements IV
Proc. SPIE 8190, Modeling max-of-n fluence distribution for optics lifetime, 81900W (23 November 2011); doi: 10.1117/12.899367
Proc. SPIE 8190, Deterministic single shot and multiple shot bulk laser damage thresholds of borosilicate glass at 1.064 micron, 81900Z (28 November 2011); doi: 10.1117/12.899301
Proc. SPIE 8190, Photothermal tomography of optical coatings based on surface thermal lensing technology, 819010 (23 November 2011); doi: 10.1117/12.899045
Poster Session: Materials and Measurements
Proc. SPIE 8190, Effect of laser beam size on laser-induced damage performance, 819012 (23 November 2011); doi: 10.1117/12.898907
Proc. SPIE 8190, Damage effects of filaments on non-transparent materials at long distances, 819013 (23 November 2011); doi: 10.1117/12.898413
Proc. SPIE 8190, Temperature dependences of fluorescence characteristic for Nd/Cr:YAG materials, 819014 (23 November 2011); doi: 10.1117/12.899047
Proc. SPIE 8190, Potential of large diameter MgF2 single crystal grown by Czochralski method, 819015 (28 November 2011); doi: 10.1117/12.899103
Proc. SPIE 8190, Characterization of optical materials and coatings for high-power NIR/VIS laser application, 819016 (23 November 2011); doi: 10.1117/12.899172
Proc. SPIE 8190, Self-laser conditioning of KDP and DKDP crystals, 819018 (23 November 2011); doi: 10.1117/12.899184
Proc. SPIE 8190, An empirical investigation of the laser survivability curve: II, 819019 (23 November 2011); doi: 10.1117/12.899271
Proc. SPIE 8190, Reflectivity measurement with optical feedback cavity ring-down technique employing a multi-longitudinal-mode diode laser, 81901C (28 November 2011); doi: 10.1117/12.905371
Surfaces, Mirrors, and Contamination
Proc. SPIE 8190, Laser-induced contamination on space optics, 81901E (28 November 2011); doi: 10.1117/12.899190
Proc. SPIE 8190, Pulsed ablation of carbon/graphite surfaces and development of plume-kinetics model, 81901F (28 November 2011); doi: 10.1117/12.899255
Poster Session: Surfaces, Mirrors, and Contamination
Proc. SPIE 8190, Formation mechanism of self-organized nanogratings induced by femtosecond laser pulses on titanium surface, 81901J (28 November 2011); doi: 10.1117/12.899109
Mini-symposium: Deep UV Optics
Proc. SPIE 8190, Absorption measurement of HR coated mirrors at 193nm with a Shack-Hartmann wavefront sensor, 81901P (28 November 2011); doi: 10.1117/12.898943
Proc. SPIE 8190, Comparative study of fused silica materials for ArF laser applications, 81901Q (28 November 2011); doi: 10.1117/12.899063
Proc. SPIE 8190, Absolute measurement of absorptance in DUV optics from laser-induced wavefront deformations, 81901S (28 November 2011); doi: 10.1117/12.899503
Proc. SPIE 8190, Impact of SiO2 and CaF2 surface composition on the absolute absorption at 193nm, 81901T (28 November 2011); doi: 10.1117/12.900042
Fundamental Mechanisms I
Proc. SPIE 8190, Electron dynamics in transparent materials under high-intensity laser irradiation, 81901W (28 November 2011); doi: 10.1117/12.899189
Proc. SPIE 8190, Laser ablation mechanism of transparent layers on semiconductors with ultrashort laser pulses, 81901Z (29 November 2011); doi: 10.1117/12.899066
Proc. SPIE 8190, Growth mechanism of laser-induced damage in fused silica, 819020 (6 December 2011); doi: 10.1117/12.899108
Fundamental Mechanisms II
Proc. SPIE 8190, Luminescence of different surface flaws in high purity silica glass under UV excitation, 819021 (28 November 2011); doi: 10.1117/12.899177
Proc. SPIE 8190, Modeling free-carrier absorption and avalanching by ultrashort laser pulses, 819022 (28 November 2011); doi: 10.1117/12.899257
Proc. SPIE 8190, On the cooperativeness of nanosecond-laser induced damage during frequency doubling of 1064 nm light in KTiOPO4, 819023 (28 November 2011); doi: 10.1117/12.899046
Proc. SPIE 8190, Carrier dynamics in KDP and DKDP crystals illuminated by intense femtosecond laser pulses, 819024 (28 November 2011); doi: 10.1117/12.898979
Poster Session: Fundamental Mechanisms
Proc. SPIE 8190, Effect of strain on laser damage and its relation with precursor defects in KDP/DKDP, 819027 (28 November 2011); doi: 10.1117/12.899170
Proc. SPIE 8190, The impact ionization coefficient in dielectric materials revisited, 819028 (28 November 2011); doi: 10.1117/12.899267
Back to Top