PROCEEDINGS VOLUME 8249
SPIE MOEMS-MEMS | 21-26 JANUARY 2012
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Proceedings Volume 8249 is from: Logo
SPIE MOEMS-MEMS
21-26 January 2012
San Francisco, California, United States
Front Matter
Proc. SPIE 8249, Front Matter: Volume 8249, 824901 (21 March 2012); doi: 10.1117/12.928109
STED Lithography Focus Session
Proc. SPIE 8249, Elucidating the kinetics and mechanism of RAPID lithography, 824902 (8 February 2012); doi: 10.1117/12.912944
Proc. SPIE 8249, Materials development for photo-inhibited super-resolution (PINSR) lithography, 824904 (8 February 2012); doi: 10.1117/12.908512
Laser-Based Fabrication I
Proc. SPIE 8249, Synthesis of super-dense phase of aluminum under extreme pressure and temperature conditions created by femtosecond laser pulses in sapphire, 82490A (8 February 2012); doi: 10.1117/12.906946
Proc. SPIE 8249, Effect of configuration of the microchannels fabricated by femtosecond laser micromachining on topological defects in confined liquid crystals, 82490B (15 February 2012); doi: 10.1117/12.908462
Micro and Nano Optics
Proc. SPIE 8249, High precision fabrication of polarization insensitive resonant grating filters, 82490C (8 February 2012); doi: 10.1117/12.912169
Proc. SPIE 8249, Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters, 82490D (8 February 2012); doi: 10.1117/12.906854
Proc. SPIE 8249, Ultrafast diffractive optical micro-trap arrays for neutral atom quantum computing, 82490E (8 February 2012); doi: 10.1117/12.910829
Proc. SPIE 8249, Fabrication of optically monolithic, low-index guided mode resonance filters, 82490F (8 February 2012); doi: 10.1117/12.908582
Proc. SPIE 8249, HSQ resist for replication stamp in polymers, 82490G (8 February 2012); doi: 10.1117/12.907862
Proc. SPIE 8249, Spatially and spectrally varying guided mode resonant filter by modifying the waveguide layer, 82490H (8 February 2012); doi: 10.1117/12.908470
3D Lithography
Proc. SPIE 8249, Thermal and optical properties of sol-gel and SU-8 resists, 82490K (8 February 2012); doi: 10.1117/12.907028
Proc. SPIE 8249, 3D microstructures fabricated by prism-assisted inclined UV lithography, 82490L (8 February 2012); doi: 10.1117/12.908191
Proc. SPIE 8249, Active and adaptive optical methods for rapid fabrication of 3D photonic structures, 82490M (15 February 2012); doi: 10.1117/12.909836
Proc. SPIE 8249, Material processing with 12 femtosecond picojoule laser pulses, 82490N (8 February 2012); doi: 10.1117/12.908284
Advanced Lithography I
Proc. SPIE 8249, Rolling mask nanolithography: the pathway to large area and low cost nanofabrication, 82490O (8 February 2012); doi: 10.1117/12.910158
Proc. SPIE 8249, Fabrication of eight-channel array single-mode waveguides via vacuum assisted microfluidics, 82490P (15 February 2012); doi: 10.1117/12.908136
Proc. SPIE 8249, Submicrometer pattern generation by diffractive mask-aligner lithography, 82490Q (15 February 2012); doi: 10.1117/12.909806
Proc. SPIE 8249, Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography, 82490R (15 February 2012); doi: 10.1117/12.908737
Photonic Device Fabrication
Proc. SPIE 8249, Tuning of random rough surface statistics for optoelectronics, 82490T (15 February 2012); doi: 10.1117/12.906601
Proc. SPIE 8249, High precision geometrical characterization and alignment of miniaturized optics, 82490U (15 February 2012); doi: 10.1117/12.908727
Proc. SPIE 8249, Gallium-nitride-based logpile photonic crystals for visible lighting, 82490V (15 February 2012); doi: 10.1117/12.915778
Proc. SPIE 8249, Programmed resist sidewall profiles using subresolution binary grayscale masks for Si-photonics applications, 82490W (15 February 2012); doi: 10.1117/12.907275
Laser-Based Fabrication II
Proc. SPIE 8249, Hybrid optics for three-dimensional microstructuring of polymers via direct laser writing, 824910 (15 February 2012); doi: 10.1117/12.908555
Proc. SPIE 8249, Generating high DOF light by using tapered hollow tube in a lithography system, 824912 (15 February 2012); doi: 10.1117/12.906722
Advanced Lithography II
Proc. SPIE 8249, Magnetostatic response of 3D metallic traces created using dynamic membrane projection lithography, 824914 (15 February 2012); doi: 10.1117/12.909393
Proc. SPIE 8249, Fabrication of large arrays of plasmonic nanostructures via double casting, 824915 (15 February 2012); doi: 10.1117/12.909943
Proc. SPIE 8249, Radio frequency plasma pre-treatment for selective electroless Ag coating of three-dimensional SU-8 microstructures, 824916 (15 February 2012); doi: 10.1117/12.908228
Proc. SPIE 8249, Exposure controlled projection lithography for microlens fabrication, 824917 (15 February 2012); doi: 10.1117/12.909087
Proc. SPIE 8249, Optical microcavities fabricated using direct proton beam writing, 824918 (15 February 2012); doi: 10.1117/12.908319
Poster Session
Proc. SPIE 8249, Monitoring of the formation of a photosensitive device by electric breakdown of an impurity containing oxide in a MOS capacitor, 824919 (15 February 2012); doi: 10.1117/12.908760
Proc. SPIE 8249, Use of ALD thin film Bragg mirror stacks in tuneable visible light MEMS Fabry-Perot interferometers, 82491A (15 February 2012); doi: 10.1117/12.905084
Proc. SPIE 8249, Optical characterization of subwavelength-scale solid immersion lenses, 82491B (9 February 2012); doi: 10.1117/12.905472
Proc. SPIE 8249, Performance evaluation of direct laser lithography system for rotationally symmetric diffractive optical elements, 82491C (15 February 2012); doi: 10.1117/12.906548
Proc. SPIE 8249, Energy-dependent temperature dynamics in femtosecond laser microprocessing clarified by Raman temperature measurement, 82491D (15 February 2012); doi: 10.1117/12.906969
Proc. SPIE 8249, Effect of reactive monomer on PS-b-P2VP film with UV irradiation, 82491E (15 February 2012); doi: 10.1117/12.907813
Proc. SPIE 8249, Effects of electric fields on the photonic crystal formation from block copolymers, 82491G (15 February 2012); doi: 10.1117/12.908423
Proc. SPIE 8249, Plasmon-enhanced optical photodiodes based on MEH-PPV polymer and fullerene blend on ITO, 82491I (15 February 2012); doi: 10.1117/12.908880
Proc. SPIE 8249, Using a dwell-time increase to compensate for SLM pixelation-limited diffraction efficiency in DMHL, 82491K (15 February 2012); doi: 10.1117/12.909073
Proc. SPIE 8249, Photoresist roughness characterization in additive lithography processes for the fabrication of phase-only optical vortices, 82491M (15 February 2012); doi: 10.1117/12.909719
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