PROCEEDINGS VOLUME 8466
SPIE NANOSCIENCE + ENGINEERING | 12-16 AUGUST 2012
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
Proceedings Volume 8466 is from: Logo
SPIE NANOSCIENCE + ENGINEERING
12-16 August 2012
San Diego, California, United States
Front Matter: Volume 8466
Proc. SPIE 8466, Front Matter: Volume 8466, 846601 (13 November 2012); doi: 10.1117/12.2011781
Nanomanufacturing Metrology I
Proc. SPIE 8466, High-rate, roll-to-roll nanomanufacturing of flexible systems, 846602 (11 October 2012); doi: 10.1117/12.940775
Proc. SPIE 8466, Metrology and instrumentation challenges with high-rate, roll-to-roll manufacturing of flexible electronic systems, 846603 (11 October 2012); doi: 10.1117/12.940778
Proc. SPIE 8466, Metrology challenges for high-rate nanomanufacturing of polymer structures, 846604 (15 October 2012); doi: 10.1117/12.953414
Proc. SPIE 8466, Performances and limitations of Lab-to-Fab strategies for inline optical metrology, 846605 (11 October 2012); doi: 10.1117/12.928368
Proc. SPIE 8466, In-line control and characterization of nanomaterials synthesis from hyperspectral polarimetric light scattering: an experimental method, 846606 (11 October 2012); doi: 10.1117/12.929836
Proc. SPIE 8466, Defect inspection strategies for 14 nm semiconductor technology, 846607 (11 October 2012); doi: 10.1117/12.928664
Novel Instruments and Improvements I
Proc. SPIE 8466, Object-depending artifacts in confocal measurements, 846609 (11 October 2012); doi: 10.1117/12.929214
Proc. SPIE 8466, Advances in metrology for the determination of Young's modulus for low-k dielectric thin films, 84660A (11 October 2012); doi: 10.1117/12.930482
Proc. SPIE 8466, Blue irradiance intercomparison in the medical field, 84660B (11 October 2012); doi: 10.1117/12.928553
Metrology and Standards
Proc. SPIE 8466, New reference material for transmission electron microscope calibration, 84660D (11 October 2012); doi: 10.1117/12.929551
Proc. SPIE 8466, First steps towards a scatterometry reference standard, 84660E (25 October 2012); doi: 10.1117/12.929903
Proc. SPIE 8466, Multiple-order imaging for optical critical dimension metrology using microscope characterization, 84660G (11 October 2012); doi: 10.1117/12.946120
Novel Instruments and Improvements II
Proc. SPIE 8466, Plasmonic-enhanced infrared photoexpansion nano-spectroscopy using tunable quantum cascade lasers, 84660I (11 October 2012); doi: 10.1117/12.929192
Proc. SPIE 8466, Active retroreflector to measure the rotational orientation in conjunction with a laser tracker, 84660J (25 October 2012); doi: 10.1117/12.929628
Proc. SPIE 8466, Imaging of short time microscopic scenes with strong light emission: revisited, 84660K (11 October 2012); doi: 10.1117/12.929577
Proc. SPIE 8466, A large-scale ceramic package of the CMOS image sensor chip for remote sensing application, 84660L (11 October 2012); doi: 10.1117/12.928388
Characterization: Macro, Micro, and Nano I
Proc. SPIE 8466, Graphene Raman imaging and spectroscopy processing: characterization of graphene growth, 84660O (25 October 2012); doi: 10.1117/12.928711
Proc. SPIE 8466, A portable modular optical sensor capable of measuring complex multi-axis strain fields, 84660Q (11 October 2012); doi: 10.1117/12.929931
Characterization: Macro, Micro, and Nano II
Proc. SPIE 8466, Non-destructive 3D characterization of microchannels, 84660R (25 October 2012); doi: 10.1117/12.930080
Proc. SPIE 8466, Optical testing for meter size aspheric optics, 84660S (25 October 2012); doi: 10.1117/12.930513
Proc. SPIE 8466, Comparison of refractive indices measured by m-lines and ellipsometry: application to polymer blend and ceramic thin films for gas sensors, 84660T (25 October 2012); doi: 10.1117/12.928693
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