PROCEEDINGS VOLUME 8522
SPIE PHOTOMASK TECHNOLOGY | 11-13 SEPTEMBER 2012
Photomask Technology 2012
Editor Affiliations +
Proceedings Volume 8522 is from: Logo
SPIE PHOTOMASK TECHNOLOGY
11-13 September 2012
Monterey, California, United States
Front Matter: Volume 8522
Proceedings Volume Photomask Technology 2012, 852201 (2012) https://doi.org/10.1117/12.2008671
Keynote Session
John Y. Chen
Proceedings Volume Photomask Technology 2012, 852202 (2012) https://doi.org/10.1117/12.981267
Invited Session
Proceedings Volume Photomask Technology 2012, 852203 (2012) https://doi.org/10.1117/12.978704
Patterning
Proceedings Volume Photomask Technology 2012, 852205 (2012) https://doi.org/10.1117/12.966327
Natalia Davydova, Robert de Kruif, Norihito Fukugami, Shinpei Kondo, Vicky Philipsen, Eelco van Setten, Brid Connolly, Ad Lammers, Vidya Vaenkatesan, et al.
Proceedings Volume Photomask Technology 2012, 852206 (2012) https://doi.org/10.1117/12.964547
Proceedings Volume Photomask Technology 2012, 852207 (2012) https://doi.org/10.1117/12.964379
Hideo Kobayashi, Hiromasa Iyama, Takeshi Kagatsume, Tsuyoshi Watanabe
Proceedings Volume Photomask Technology 2012, 852208 (2012) https://doi.org/10.1117/12.973668
Proceedings Volume Photomask Technology 2012, 852209 (2012) https://doi.org/10.1117/12.961118
Sylvain Moulis, Vincent Farys, Jérôme Belledent, Romain Thérèse, Song Lan, Qian Zhao, Mu Feng, Laurent Depre, Russell Dover
Proceedings Volume Photomask Technology 2012, 85220A (2012) https://doi.org/10.1117/12.966383
Metrology
Proceedings Volume Photomask Technology 2012, 85220B (2012) https://doi.org/10.1117/12.965531
Mei-Chun Lin, Ching-Fang Yu, Mei-Tsu Lai, Luke T. H. Hsu, Angus Chin, Anthony Yen
Proceedings Volume Photomask Technology 2012, 85220C (2012) https://doi.org/10.1117/12.977944
Proceedings Volume Photomask Technology 2012, 85220D (2012) https://doi.org/10.1117/12.980258
Proceedings Volume Photomask Technology 2012, 85220E (2012) https://doi.org/10.1117/12.970523
Guoxiang Ning, Frank Richter, Thomas Thamm, Paul Ackmann, Marc Staples, Francois Weisbuch, Karin Kurth, Joerg Schenker, Andre Leschok, et al.
Proceedings Volume Photomask Technology 2012, 85220F (2012) https://doi.org/10.1117/12.964376
Proceedings Volume Photomask Technology 2012, 85220G (2012) https://doi.org/10.1117/12.977248
Mask Inspection and Repair I
Proceedings Volume Photomask Technology 2012, 85220H (2012) https://doi.org/10.1117/12.964965
Proceedings Volume Photomask Technology 2012, 85220I (2012) https://doi.org/10.1117/12.977853
Linyong Pang, Masaki Satake, Ying Li, Peter Hu, Vikram Tolani, Danping Peng, Dongxue Chen, Bob Gleason
Proceedings Volume Photomask Technology 2012, 85220J (2012) https://doi.org/10.1117/12.977174
Masato Naka, Shinji Yamaguchi, Motoki Kadowaki, Toru Koike, Takashi Hirano, Masamitsu Itoh, Yuichiro Yamazaki, Kenji Terao, Masahiro Hatakeyama, et al.
Proceedings Volume Photomask Technology 2012, 85220K (2012) https://doi.org/10.1117/12.964099
Takeya Shimomura, Shogo Narukawa, Tsukasa Abe, Tadahiko Takikawa, Naoya Hayashi, Fei Wang, Long Ma, Chia-Wen Lin, Yan Zhao, et al.
Proceedings Volume Photomask Technology 2012, 85220L (2012) https://doi.org/10.1117/12.976017
Proceedings Volume Photomask Technology 2012, 85220M (2012) https://doi.org/10.1117/12.964964
Material and Process
Proceedings Volume Photomask Technology 2012, 85220N (2012) https://doi.org/10.1117/12.978665
Luisa D. Bozano, Ratnam Sooriyakumaran, Takayuki Nagasawa, Satoshi Watanabe, Yoshio Kawai, Shinpei Kondo, Jun Kotani, Masayuki Kagawa, Linda K. Sundberg, et al.
Proceedings Volume Photomask Technology 2012, 85220O (2012) https://doi.org/10.1117/12.977181
Proceedings Volume Photomask Technology 2012, 85220P (2012) https://doi.org/10.1117/12.970395
Chang Ju Choi, Karmen Yung, Cheng-Hsin Ma, Ganesh Vanamu
Proceedings Volume Photomask Technology 2012, 85220Q (2012) https://doi.org/10.1117/12.977137
Dong Il Shin, Sang Jin Jo, Hee Yeon Jang, Yun Ki Hong, Dae Ho Hwang, Chung Seon Choi, Dong Sik Jang, Ho Yong Jung, Tae Joong Ha, et al.
Proceedings Volume Photomask Technology 2012, 85220R (2012) https://doi.org/10.1117/12.964974
Proceedings Volume Photomask Technology 2012, 85220S (2012) https://doi.org/10.1117/12.976878
Mask Data Preparation I
Hyun-Jong Lee, Soo-Han Choi, Jae-Seok Yang, Kwan-Young Chun, Jeong-ho Do, Chul-Hong Park
Proceedings Volume Photomask Technology 2012, 85220T (2012) https://doi.org/10.1117/12.964976
Proceedings Volume Photomask Technology 2012, 85220U (2012) https://doi.org/10.1117/12.979350
D. Hung, J. P. Canepa, K. Kuo, J. G. Jou
Proceedings Volume Photomask Technology 2012, 85220V (2012) https://doi.org/10.1117/12.964293
Proceedings Volume Photomask Technology 2012, 85220W (2012) https://doi.org/10.1117/12.964408
D. Salazar, W. Moore, J. Valadez
Proceedings Volume Photomask Technology 2012, 85220X (2012) https://doi.org/10.1117/12.966809
Simulation and Modeling
Proceedings Volume Photomask Technology 2012, 85220Y (2012) https://doi.org/10.1117/12.965225
Linyong Pang, Vikram Tolani, Masaki Satake, Peter Hu, Danping Peng, Tingyang Liu, Dongxue Chen, Bob Gleason, Anthony Vacca
Proceedings Volume Photomask Technology 2012, 85220Z (2012) https://doi.org/10.1117/12.977176
Peter Stoltz, Alex Likhanskii, Chuandong Zhou, Vibhu Jindal, Patrick Kearney
Proceedings Volume Photomask Technology 2012, 852210 (2012) https://doi.org/10.1117/12.979599
Proceedings Volume Photomask Technology 2012, 852211 (2012) https://doi.org/10.1117/12.2009117
Cleaning/Contamination/Haze
Kuan-Wen Lin, Chi-Lun Lu, Chin-Wei Shen, Luke Hsu, Angus Chin, Anthony Yen
Proceedings Volume Photomask Technology 2012, 852213 (2012) https://doi.org/10.1117/12.975822
Göksel Durkaya, Abbas Rastegar, Hüseyin Kurtuldu
Proceedings Volume Photomask Technology 2012, 852214 (2012) https://doi.org/10.1117/12.976060
Proceedings Volume Photomask Technology 2012, 852215 (2012) https://doi.org/10.1117/12.964984
Arun John Kadaksham, Ranganath Teki, Jenah Harris-Jones, C. C. Lin
Proceedings Volume Photomask Technology 2012, 852216 (2012) https://doi.org/10.1117/12.976980
Hrishi Shende, SherJang Singh, James Baugh, Uwe Dietze, Peter Dress
Proceedings Volume Photomask Technology 2012, 852217 (2012) https://doi.org/10.1117/12.979342
Ivin Varghese, Ben Smith, Mehdi Balooch, Chuck Bowers
Proceedings Volume Photomask Technology 2012, 852218 (2012) https://doi.org/10.1117/12.976889
Source/Mask Optimization
Proceedings Volume Photomask Technology 2012, 852219 (2012) https://doi.org/10.1117/12.964292
Dmitry Vengertsev, Kihyun Kim, Seung-Hune Yang, Seongbo Shim, Seongho Moon, Artem Shamsuarov, Sooryong Lee, Seong-Woon Choi, Jungdal Choi, et al.
Proceedings Volume Photomask Technology 2012, 85221A (2012) https://doi.org/10.1117/12.953827
Kellen Arb, Chris Reid, Qiao Li, Evgueni Levine, Pradiptya Ghosh
Proceedings Volume Photomask Technology 2012, 85221B (2012) https://doi.org/10.1117/12.979143
Mask Long-Term Durability
Proceedings Volume Photomask Technology 2012, 85221D (2012) https://doi.org/10.1117/12.968166
Astrid Gettel, Detlev Glüer, Alfred Honold
Proceedings Volume Photomask Technology 2012, 85221E (2012) https://doi.org/10.1117/12.963739
Mask Pattern Generators
Hiroshi Matsumoto, Yasuo Kato, Noriaki Nakayamada, Shusuke Yoshitake, Kiyoshi Hattori
Proceedings Volume Photomask Technology 2012, 85221G (2012) https://doi.org/10.1117/12.975920
Elmar Platzgummer, Christof Klein, Hans Loeschner
Proceedings Volume Photomask Technology 2012, 85221H (2012) https://doi.org/10.1117/12.964988
Yasuki Kimura, Ryuuji Yamamoto, Takao Kubota, Kenji Kouno, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara
Proceedings Volume Photomask Technology 2012, 85221I (2012) https://doi.org/10.1117/12.958601
Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, et al.
Proceedings Volume Photomask Technology 2012, 85221J (2012) https://doi.org/10.1117/12.964978
Proceedings Volume Photomask Technology 2012, 85221K (2012) https://doi.org/10.1117/12.977172
Mask Inspection and Repair II
Proceedings Volume Photomask Technology 2012, 85221L (2012) https://doi.org/10.1117/12.974749
Proceedings Volume Photomask Technology 2012, 85221M (2012) https://doi.org/10.1117/12.966387
Vikram Tolani, Grace Dai, Suresh Lakkapragada, Peter Hu, Kechang Wang, Lin He, Ying Li, Danping Peng, George Hwa, et al.
Proceedings Volume Photomask Technology 2012, 85221O (2012) https://doi.org/10.1117/12.977138
Poster Session: Cleaning
Proceedings Volume Photomask Technology 2012, 85221P (2012) https://doi.org/10.1117/12.964960
Hüseyin Kurtuldu, Abbas Rastegar, Matthew House
Proceedings Volume Photomask Technology 2012, 85221Q (2012) https://doi.org/10.1117/12.976857
Poster Session: Mask Inspection and Repair
Yuelin Du, Hongbo Zhang, Martin D. F. Wong
Proceedings Volume Photomask Technology 2012, 85221R (2012) https://doi.org/10.1117/12.964103
Proceedings Volume Photomask Technology 2012, 85221S (2012) https://doi.org/10.1117/12.964282
Proceedings Volume Photomask Technology 2012, 85221U (2012) https://doi.org/10.1117/12.976819
Thiago S. Jota, Tom D. Milster
Proceedings Volume Photomask Technology 2012, 85221V (2012) https://doi.org/10.1117/12.977205
Ahmad Elayat, Peter Thwaite, Steffen Schulze
Proceedings Volume Photomask Technology 2012, 85221W (2012) https://doi.org/10.1117/12.979154
Guoxiang Ning, Christian Holfeld, Daniel Fischer, Paul Ackmann, Andre Holfeld, Karin Kurth, Martin Sczyrba, Tino Hertzsch, Rolf Seltmann, et al.
Proceedings Volume Photomask Technology 2012, 85221X (2012) https://doi.org/10.1117/12.958607
Mark Pereira, Manabendra Maji, Ravi R. Pai, Samir B. V. R., Seshadri R., Pradeepkumar Patil
Proceedings Volume Photomask Technology 2012, 85221Y (2012) https://doi.org/10.1117/12.964403
Saghir Munir, Gul Qidwai
Proceedings Volume Photomask Technology 2012, 85221Z (2012) https://doi.org/10.1117/12.964981
Proceedings Volume Photomask Technology 2012, 852220 (2012) https://doi.org/10.1117/12.981345
Poster Session: Mask Data Preparation
Tamer Desouky, David Abercrombie, Hojun Kim, Soo-Han Choi
Proceedings Volume Photomask Technology 2012, 852221 (2012) https://doi.org/10.1117/12.946589
Amr G. Wassal, Heba Sharaf, Sherif Hammouda
Proceedings Volume Photomask Technology 2012, 852222 (2012) https://doi.org/10.1117/12.964381
Mark Lu, Cong-shu Zhou, Yi Tian, Soo Muay Goh, Shyue-Fong Quek, Hein-Mun Lam, Jian Zhang
Proceedings Volume Photomask Technology 2012, 852223 (2012) https://doi.org/10.1117/12.964400
Daniel Salazar, Bill Moore, John Valadez
Proceedings Volume Photomask Technology 2012, 852224 (2012) https://doi.org/10.1117/12.964982
Proceedings Volume Photomask Technology 2012, 852225 (2012) https://doi.org/10.1117/12.977135
Poster Session: Metrology
Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, et al.
Proceedings Volume Photomask Technology 2012, 852226 (2012) https://doi.org/10.1117/12.964994
Poster Session: Mask Pattern Generators
Proceedings Volume Photomask Technology 2012, 852228 (2012) https://doi.org/10.1117/12.964098
T. Klimpel, J. Klikovits, R. Zimmermann, M. Schulz, Alex Zepka, H.-J. Stock
Proceedings Volume Photomask Technology 2012, 852229 (2012) https://doi.org/10.1117/12.964405
Masahiro Takizawa, Keita Bunya, Hideaki Isobe, Hideaki Komami, Kenji Abe, Masaki Kurokawa, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura, et al.
Proceedings Volume Photomask Technology 2012, 85222A (2012) https://doi.org/10.1117/12.964985
Poster Session: Patterning
Zhengqing John Qi, Emily Gallagher, Yoshiyuki Negishi, Gregory McIntyre, Amy Zweber, Tasuku Senna, Satoshi Akutagawa, Toshio Konishi
Proceedings Volume Photomask Technology 2012, 85222H (2012) https://doi.org/10.1117/12.976855
Yoshinori Iino, Makoto Karyu, Hirotsugu Ita, Yoshihisa Kase, Tomoaki Yoshimori, Makoto Muto, Mikio Nonaka, Munenori Iwami
Proceedings Volume Photomask Technology 2012, 85222I (2012) https://doi.org/10.1117/12.1000107
Poster Session: Process
GuoXiang Ning, Christian Buergel, Paul Ackmann, Marc Staples, Thomas Thamm, Chin Teong Lim, Andre Leschok, Stefan Roling, Anthony Zhou, et al.
Proceedings Volume Photomask Technology 2012, 85222J (2012) https://doi.org/10.1117/12.964375
Proceedings Volume Photomask Technology 2012, 85222K (2012) https://doi.org/10.1117/12.977189
Jong Hoon Lim, Sung Ha Woo, Eui-Sang Park, Sang Pyo Kim, Dong Gyu Yim, Osamu Katada, Tobias Wähler, Peter Dress, Uwe Dietze
Proceedings Volume Photomask Technology 2012, 85222L (2012) https://doi.org/10.1117/12.979470
Michael Grimbergen, Madhavi Chandrachood, Keven Yu, Toi Yue Becky Leung, Amitabh Sabharwal, Ajay Kumar
Proceedings Volume Photomask Technology 2012, 85222M (2012) https://doi.org/10.1117/12.981215
Poster Session: Simulation
Bin Lin, Zheng Shi, Ye Chen
Proceedings Volume Photomask Technology 2012, 85222O (2012) https://doi.org/10.1117/12.964384
Adam Lyons, John Hartley
Proceedings Volume Photomask Technology 2012, 85222P (2012) https://doi.org/10.1117/12.976951
Peter van der Walle, Pragati Kumar, Dmitry Ityaksov, Richard Versulis, Diederik J. Maas, Olaf Kievit, Jochem Janssen, Jacques C. J. van der Donck
Proceedings Volume Photomask Technology 2012, 85222Q (2012) https://doi.org/10.1117/12.2006408
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