Front Matter: Volume 8530
Proc. SPIE 8530, Front Matter: Volume 8530, 853001 (17 December 2012); doi: 10.1117/12.2017703
Fundamental Mechanisms II
Proc. SPIE 8530, Dynamics of fracture inside a single crystal induced by a focused femtosecond laser pulse, 853003 (4 December 2012); doi: 10.1117/12.976339
Proc. SPIE 8530, Spectroscopic investigation of fs laser-induced defects in polymer and crystal media, 853004 (4 December 2012); doi: 10.1117/12.975812
Proc. SPIE 8530, Temperature dependence of laser-induced damage thresholds by short pulse laser, 853005 (4 December 2012); doi: 10.1117/12.976275
Fundamental Mechanisms III
Proc. SPIE 8530, Optical damage threshold and energy deposition in the embedded nanostructures, 853006 (4 December 2012); doi: 10.1117/12.977307
Proc. SPIE 8530, Laser ablation mechanism of transparent dielectrics with picosecond laser pulses, 853007 (4 December 2012); doi: 10.1117/12.976062
Proc. SPIE 8530, The damage mechanism in borosilicate glass generated by nanosecond pulsed laser at 1.064 μm, 853008 (4 December 2012); doi: 10.1117/12.979243
Proc. SPIE 8530, Surface and bulk effects in silica fibers caused by 405 nm CW diode laser irradiation and means for mitigation, 85300A (4 December 2012); doi: 10.1117/12.976837
Fundamental Mechanisms IV
Proc. SPIE 8530, Correlation of UV damage threshold with post-annealing in CVD-grown SiO[sub]2[/sub] overlayers on etched fused silica substrates, 85300B (4 December 2012); doi: 10.1117/12.979210
Poster Session: Fundamental Mechanisms
Proc. SPIE 8530, Modeling energy transfer and transport in laser-excited dielectrics, 85300G (4 December 2012); doi: 10.1117/12.978845
Thin Films I
Proc. SPIE 8530, What role do defects play in the laser damage behavior of metal oxides?, 85300J (4 December 2012); doi: 10.1117/12.981732
Proc. SPIE 8530, An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations, 85300K (29 November 2012); doi: 10.1117/12.977553
Proc. SPIE 8530, Effect of pulse duration on laser induced damage threshold of multilayer dielectric gratings, 85300L (4 December 2012); doi: 10.1117/12.977339
Proc. SPIE 8530, Brewster Angle Polarizing Beamsplitter Laser Damage Competition: P polarization, 85300M (4 December 2012); doi: 10.1117/12.981735
Thin Films II
Proc. SPIE 8530, Continued advancement of laser damage resistant optically functional microstructures, 85300O (4 December 2012); doi: 10.1117/12.976909
Proc. SPIE 8530, Laser damage resistant anti-reflection microstructures for mid-infrared metal-ion doped ZnSe gain media, 85300P (4 December 2012); doi: 10.1117/12.2016402
Proc. SPIE 8530, Multiple wavelength laser induced damage of multilayer beam splitters, 85300Q (29 November 2012); doi: 10.1117/12.977254
Proc. SPIE 8530, A statistical study of the relationship between surface quality and laser induced damage, 85300R (4 December 2012); doi: 10.1117/12.976631
Proc. SPIE 8530, Role of oxidizing agent: thin film formation by photo-oxidizing silicone oil for vacuum UV rays transmittance and high hardness, 85300S (4 December 2012); doi: 10.1117/12.977393
Poster Session: Thin Films
Proc. SPIE 8530, Oxide mixtures for UV coatings, 85300T (4 December 2012); doi: 10.1117/12.977494
Proc. SPIE 8530, Applying hafnia mixtures to enhance the laser-induced damage threshold of coatings for third-harmonic generation optics, 85300W (4 December 2012); doi: 10.1117/12.971225
Proc. SPIE 8530, Measured nanosecond laser damage probabilities of niobia-silica and zirconia-silica mixtures coatings, 85300X (4 December 2012); doi: 10.1117/12.977557
Proc. SPIE 8530, Optical resistance of GaN and InGaN thin films, 85300Y (4 December 2012); doi: 10.1117/12.977451
Proc. SPIE 8530, Ion beam sputtered Y2O3, 85300Z (4 December 2012); doi: 10.1117/12.976808
Proc. SPIE 8530, Laser induced damage threshold and optical properties of TiO[sub]2[/sub] and Al[sub]2[/sub]O[sub]3[/sub] coatings prepared by atomic layer deposition, 853010 (4 December 2012); doi: 10.1117/12.976859
Materials and Measurements I
Proc. SPIE 8530, Coatings of oxide composites, 853013 (4 December 2012); doi: 10.1117/12.981526
Materials and Measurements II
Proc. SPIE 8530, The role of polymer-mediated dopant correlations in damage moderation and self healing, 853014 (4 December 2012); doi: 10.1117/12.977184
Proc. SPIE 8530, A high-energy fibre-to-fibre connection for direct optical initiation systems, 853016 (4 December 2012); doi: 10.1117/12.978076
Proc. SPIE 8530, Energy losses in thermally cycled optical fibers constrained in small bend radii, 853017 (4 December 2012); doi: 10.1117/12.977552
Proc. SPIE 8530, Neutron testing of high-power optical fibers, 853018 (4 December 2012); doi: 10.1117/12.977489
Materials and Measurements III
Proc. SPIE 8530, Light scattering to detect imperfections relevant for laser-induced damage, 85301B (4 December 2012); doi: 10.1117/12.977453
Proc. SPIE 8530, Advanced LIDT testing station in the frame of the HiLASE Project, 85301D (4 December 2012); doi: 10.1117/12.977405
Materials and Measurements IV
Proc. SPIE 8530, Laser-induced surface damage density measurements with small and large beams: the representativeness light, 85301F (4 December 2012); doi: 10.1117/12.976840
Proc. SPIE 8530, Electric field dependent decay and recovery of DO11 doped into PMMA thin films: beyond 100% recovery?, 85301G (4 December 2012); doi: 10.1117/12.977203
Proc. SPIE 8530, 355nm absorption in HfO2 and SiO2 monolayers with embedded Hf nanoclusters studied using photothermal heterodyne imaging, 85301H (4 December 2012); doi: 10.1117/12.981642
Poster Session: Materials and Measurements
Proc. SPIE 8530, Separation of different loss channels in DUV optical elements, 85301K (4 December 2012); doi: 10.1117/12.977880
Proc. SPIE 8530, Improving laser damage threshold measurements: an explosive analogy, 85301L (4 December 2012); doi: 10.1117/12.977591
Proc. SPIE 8530, Automated test station for characterization of optical resistance with ultrashort pulses at multi kilohertz repetition rates, 85301M (4 December 2012); doi: 10.1117/12.977530
Proc. SPIE 8530, An empirical investigation of the laser survivability curve: III, 85301N (4 December 2012); doi: 10.1117/12.977477
Proc. SPIE 8530, Automated laser damage threshold test systems of different test modes for optical elements, 85301P (4 December 2012); doi: 10.1117/12.977448
Proc. SPIE 8530, Bayesian approach of laser-induced damage threshold analysis and determination of error bars, 85301S (4 December 2012); doi: 10.1117/12.976315
Proc. SPIE 8530, Laser damage testing of optical components under cryogenic conditions, 85301T (4 December 2012); doi: 10.1117/12.977435
Proc. SPIE 8530, Laser removal of positive-tone diazonaphthoquinone / novolak resist without occurring laser-induced damage to the silicon wafer, 85301V (4 December 2012); doi: 10.1117/12.977338
Proc. SPIE 8530, Sandwich concept: enhancement for direct absorption measurements by laser-induced deflection (LID) technique, 85301X (4 December 2012); doi: 10.1117/12.976853
Proc. SPIE 8530, Automated test station for laser-induced damage threshold measurements according to ISO 21254-1,2,3,4 standards, 85301Y (4 December 2012); doi: 10.1117/12.976845
Proc. SPIE 8530, Parallel use of detection channels for LIDT testing in the UV-Range, 85301Z (4 December 2012); doi: 10.1117/12.977342
Mini-Symposium: Laser-Induced Plasma Interactions
Proc. SPIE 8530, Laser-induced gas plasma etching of fused silica under ambient conditions, 853022 (4 December 2012); doi: 10.1117/12.979814
Surfaces, Mirrors, and Contamination
Proc. SPIE 8530, Measurement of debris and shrapnel plumes from cylindrical metal targets used in high-power laser systems, 853023 (4 December 2012); doi: 10.1117/12.977221
Proc. SPIE 8530, Influences of oil-contamination on LIDT and optical properties in dielectric coatings, 853024 (4 December 2012); doi: 10.1117/12.977705
Poster Session: Surfaces, Mirrors, and Contamination
Proc. SPIE 8530, Study of the LIDT degradation of optical components by intentional organic contamination, 853025 (4 December 2012); doi: 10.1117/12.968573
Proc. SPIE 8530, Characterization of scratches on fused silica optics and a way to remove them, 853026 (4 December 2012); doi: 10.1117/12.976839
Proc. SPIE 8530, Effect of conventional fused silica preparation and deposition techniques on surface roughness, scattering, and laser damage resistance, 853027 (4 December 2012); doi: 10.1117/12.977244
Proc. SPIE 8530, Laser-induced damage resistance of UV coatings on fused silica and CaF2, 853029 (4 December 2012); doi: 10.1117/12.2007286
Proc. SPIE 8530, Contamination resistant coatings for enhanced laser damage thresholds, 85302A (4 December 2012); doi: 10.1117/12.2011179
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