PROCEEDINGS VOLUME 9235
SPIE PHOTOMASK TECHNOLOGY | 16-18 SEPTEMBER 2014
Photomask Technology 2014
Editor Affiliations +
Proceedings Volume 9235 is from: Logo
SPIE PHOTOMASK TECHNOLOGY
16-18 September 2014
Monterey, California, United States
Front Matter: Volume 9235
Proceedings Volume Photomask Technology 2014, 923501 (2014) https://doi.org/10.1117/12.2081279
Simulation, OPC, and Mask Data Prep I
Bei Yu, Gilda Garreton, David Z. Pan
Proceedings Volume Photomask Technology 2014, 923504 (2014) https://doi.org/10.1117/12.2066034
Qi Lin, Toshiyuki Hisamura, Nui Chong, Hans Pan, Yun Wu, Jonathan Chang, Xin Wu
Proceedings Volume Photomask Technology 2014, 923505 (2014) https://doi.org/10.1117/12.2066262
Piyush Verma, Fadi Batarseh, Shikha Somani, Jingyu Wang, Sarah McGowan, Sriram Madhavan
Proceedings Volume Photomask Technology 2014, 923506 (2014) https://doi.org/10.1117/12.2068998
Jingyu Wang, Piyush Verma, Alexander Wei, William Wilkinson
Proceedings Volume Photomask Technology 2014, 923507 (2014) https://doi.org/10.1117/12.2067814
Simulation, OPC, and Mask Data Prep II
Proceedings Volume Photomask Technology 2014, 923508 (2014) https://doi.org/10.1117/12.2073368
Proceedings Volume Photomask Technology 2014, 92350A (2014) https://doi.org/10.1117/12.2069617
Ute Buttgereit, Thomas Trautzsch, Min-ho Kim, Jung-Uk Seo, Young-Keun Yoon, Hak-Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Gary Meyers
Proceedings Volume Photomask Technology 2014, 92350B (2014) https://doi.org/10.1117/12.2065937
Proceedings Volume Photomask Technology 2014, 92350C (2014) https://doi.org/10.1117/12.2069353
Materials and Process I
Munenori Iwami, Hirotsugu Ita, Yoshihisa Kase, Hidehito Azumano, Kazuki Nakazawa, Yoshie Okamoto, Hiroki Shirahama, Tomoaki Yoshimori, Makoto Muto, et al.
Proceedings Volume Photomask Technology 2014, 92350D (2014) https://doi.org/10.1117/12.2073069
Proceedings Volume Photomask Technology 2014, 92350E (2014) https://doi.org/10.1117/12.2066378
Proceedings Volume Photomask Technology 2014, 92350F (2014) https://doi.org/10.1117/12.2069435
Proceedings Volume Photomask Technology 2014, 92350G (2014) https://doi.org/10.1117/12.2066278
Metrology: Joint Session with Photomask and Scanning Microscopies
Proceedings Volume Photomask Technology 2014, 92350I (2014) https://doi.org/10.1117/12.2066173
EUV Mask I
Proceedings Volume Photomask Technology 2014, 92350J (2014) https://doi.org/10.1117/12.2066222
Markus P. Benk, Ryan H. Miyakawa, Weilun Chao, Yow-Gwo Wang, Antoine Wojdyla, David G. Johnson, Alexander P. Donoghue, Kenneth A. Goldberg
Proceedings Volume Photomask Technology 2014, 92350K (2014) https://doi.org/10.1117/12.2065513
Proceedings Volume Photomask Technology 2014, 92350L (2014) https://doi.org/10.1117/12.2069291
Masato Naka, Ryoji Yoshikawa, Shinji Yamaguchi, Takashi Hirano, Masamitsu Itoh, Kenji Terao, Masahiro Hatakeyama, Kenji Watanabe, Hiroshi Sobukawa, et al.
Proceedings Volume Photomask Technology 2014, 92350M (2014) https://doi.org/10.1117/12.2069161
Proceedings Volume Photomask Technology 2014, 92350N (2014) https://doi.org/10.1117/12.2068308
Materials and Process II
Kosuke Koshijima, Michihiro Shirakawa, So Kamimura, Keita Katou
Proceedings Volume Photomask Technology 2014, 92350O (2014) https://doi.org/10.1117/12.2072470
T. Faure, A. Zweber, L. Bozano, M. Sanchez, R. Sooriyakumaran, L. Sundberg, Y. Sakamoto, S. Nash, M. Kagawa, et al.
Proceedings Volume Photomask Technology 2014, 92350P (2014) https://doi.org/10.1117/12.2069031
Shazad Paracha, Eliot Goodman, Benjamin G. Eynon, Ben F. Noyes III, Steven Ha, Jong-Min Kim, Dong-Seok Lee, Dong-Heok Lee, Sang-Soo Cho, et al.
Proceedings Volume Photomask Technology 2014, 92350Q (2014) https://doi.org/10.1117/12.2070256
K. Edinger, K. Wolff, H. Steigerwald, N. Auth, P. Spies, J. Oster, H. Schneider, M. Budach, T. Hofmann, et al.
Proceedings Volume Photomask Technology 2014, 92350R (2014) https://doi.org/10.1117/12.2072474
Rémi Rivière, Selvi Gopalakrishnan, Martin Mazur, Nevzat Öner, Sven Mühle, Rolf Seltmann
Proceedings Volume Photomask Technology 2014, 92350S (2014) https://doi.org/10.1117/12.2059622
Simulation, OPC, and Mask Data Prep III
Proceedings Volume Photomask Technology 2014, 92350T (2014) https://doi.org/10.1117/12.2070163
Proceedings Volume Photomask Technology 2014, 92350U (2014) https://doi.org/10.1117/12.2066156
Clyde Browning, Thomas Quaglio, Thiago Figueiro, Sébastien Pauliac, Jérôme Belledent, Aurélien Fay, Jessy Bustos, Jean-Christophe Marusic, Patrick Schiavone
Proceedings Volume Photomask Technology 2014, 92350V (2014) https://doi.org/10.1117/12.2069335
Mask Patterning
Proceedings Volume Photomask Technology 2014, 92350W (2014) https://doi.org/10.1117/12.2072135
Hidekazu Takekoshi, Takahito Nakayama, Kenichi Saito, Hiroyoshi Ando, Hideo Inoue, Noriaki Nakayamada, Takashi Kamikubo, Rieko Nishimura, Yoshinori Kojima, et al.
Proceedings Volume Photomask Technology 2014, 92350X (2014) https://doi.org/10.1117/12.2065551
Jongsu Kim, Jihoon Kang, Inhwan Noh, Sookhyun Lee, Soeun Shin, Sungil Lee, Hyunchung Ha, Hojune Lee, Jin Choi, et al.
Proceedings Volume Photomask Technology 2014, 92350Y (2014) https://doi.org/10.1117/12.2065930
Vadim Sidorkin, Michael Finken, Timo Wandel, Noriaki Nakayamada, G. R. Cantrell
Proceedings Volume Photomask Technology 2014, 92350Z (2014) https://doi.org/10.1117/12.2066126
EUV Mask II
Christina Turley, Ravi Bonam, Emily Gallagher, Jonathan Grohs, Masayuki Kagawa, Louis Kindt, Eisuke Narita, Steven Nash, Yoshifumi Sakamoto
Proceedings Volume Photomask Technology 2014, 923513 (2014) https://doi.org/10.1117/12.2070047
Proceedings Volume Photomask Technology 2014, 923514 (2014) https://doi.org/10.1117/12.2069376
EUV Mask III
Proceedings Volume Photomask Technology 2014, 923515 (2014) https://doi.org/10.1117/12.2067892
Proceedings Volume Photomask Technology 2014, 923516 (2014) https://doi.org/10.1117/12.2069787
N. B. Koster, C. P. E. C. Geluk, T. W. Versloot, J. P. B. Janssen, Y. Fleming, T. Wirtz
Proceedings Volume Photomask Technology 2014, 923517 (2014) https://doi.org/10.1117/12.2066471
Daisuke Matsushima, Kensuke Demura, Satoshi Nakamura, Masafumi Suzuki, Katsuhiro Kishimoto, Makoto Muto
Proceedings Volume Photomask Technology 2014, 923518 (2014) https://doi.org/10.1117/12.2070235
Poster Session: EUV Mask
Rene A. Claus, Andrew R. Neureuther, Patrick P. Naulleau, Laura Waller
Proceedings Volume Photomask Technology 2014, 92351A (2014) https://doi.org/10.1117/12.2069073
Proceedings Volume Photomask Technology 2014, 92351B (2014) https://doi.org/10.1117/12.2065655
Ryoichi Hirano, Susumu Iida, Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Masahiro Hatakeyama, Takeshi Murakami, Shoji Yoshikawa, Kenji Terao
Proceedings Volume Photomask Technology 2014, 92351C (2014) https://doi.org/10.1117/12.2066134
Victor Soltwisch, Jan Wernecke, Anton Haase, Jürgen Probst, Max Schoengen, Michael Krumrey, Frank Scholze, Jan Pomplun, Sven Burger
Proceedings Volume Photomask Technology 2014, 92351D (2014) https://doi.org/10.1117/12.2066165
Proceedings Volume Photomask Technology 2014, 92351E (2014) https://doi.org/10.1117/12.2066297
Proceedings Volume Photomask Technology 2014, 92351F (2014) https://doi.org/10.1117/12.2083713
Poster Session: Business
Proceedings Volume Photomask Technology 2014, 92351G (2014) https://doi.org/10.1117/12.2065574
Poster Session: Inspection
Proceedings Volume Photomask Technology 2014, 92351H (2014) https://doi.org/10.1117/12.2068370
Proceedings Volume Photomask Technology 2014, 92351I (2014) https://doi.org/10.1117/12.2068466
Tom Boettiger, Peter Buck, Sankaranarayanan Paninjath, Mark Pereira, Rob Ronald, Dan Rost, Bhamidipati Samir
Proceedings Volume Photomask Technology 2014, 92351J (2014) https://doi.org/10.1117/12.2069678
Sang Hoon Han, Hong Yul Jung, Sun Pyo Lee, In-Yong Kang, Gi Sung Yoon, Dong Hoon Chung, Chan-Uk Jeon, Yulia Brand, Yair Eran, et al.
Proceedings Volume Photomask Technology 2014, 92351K (2014) https://doi.org/10.1117/12.2076308
Poster Session: Material and Process
Chang-Jun Kim, Kyu-Jin Jang, Min-Ki Choi, Chul-Kyu Yang, Jae-Chul Lee, Jong-Keun Lee, Byung-Sun Kang, Jong-Hwa Lee, Cheol Shin, et al.
Proceedings Volume Photomask Technology 2014, 92351L (2014) https://doi.org/10.1117/12.2066112
Noriyuki Harashima, Hiroyuki Iso, Tatsuya Chishima
Proceedings Volume Photomask Technology 2014, 92351M (2014) https://doi.org/10.1117/12.2066075
Proceedings Volume Photomask Technology 2014, 92351N (2014) https://doi.org/10.1117/12.2066279
Poster Session: Metrology
Kujan Gorhad, Avi Cohen, Dan Avizemer, Vladimir Dmitriev, Dirk Beyer, Wolfgang Degel, Markus Kirsch
Proceedings Volume Photomask Technology 2014, 92351P (2014) https://doi.org/10.1117/12.2066145
Proceedings Volume Photomask Technology 2014, 92351R (2014) https://doi.org/10.1117/12.2066283
Dirk Beyer, Dirk Seidel, Sven Heisig, Steffen Steinert, Susanne Töpfer, Thomas Scherübl, Jochen Hetzler
Proceedings Volume Photomask Technology 2014, 92351S (2014) https://doi.org/10.1117/12.2069925
Poster Session: Mask Data Preparation
Proceedings Volume Photomask Technology 2014, 92351T (2014) https://doi.org/10.1117/12.2069677
Proceedings Volume Photomask Technology 2014, 92351U (2014) https://doi.org/10.1117/12.2066169
Proceedings Volume Photomask Technology 2014, 92351V (2014) https://doi.org/10.1117/12.2066180
Proceedings Volume Photomask Technology 2014, 92351W (2014) https://doi.org/10.1117/12.2070544
Proceedings Volume Photomask Technology 2014, 92351Y (2014) https://doi.org/10.1117/12.2069346
Proceedings Volume Photomask Technology 2014, 92351Z (2014) https://doi.org/10.1117/12.2069473
Poster Session: Patterning
JC Marusic, ML Pourteau, S. Cêtre, L. Pain, AP Mebiene-Engohang, S. David, S. Labau, J. Boussey
Proceedings Volume Photomask Technology 2014, 923520 (2014) https://doi.org/10.1117/12.2066152
Takuya Tao, Nobuyasu Takahashi, Masakazu Hamaji, Jisoong Park, Sukho Lee, Sunghoon Park
Proceedings Volume Photomask Technology 2014, 923521 (2014) https://doi.org/10.1117/12.2069240
Poster Session: Yield Management
Richard van Haren, Hakki Ergun Cekli, Xing Lan Liu, Jan Beltman, Anne Pastol, Jean Massin, Emilie Dupre La Tour, Maxime Gatefait, Frank Sundermann
Proceedings Volume Photomask Technology 2014, 923522 (2014) https://doi.org/10.1117/12.2069315
Proceedings Volume Photomask Technology 2014, 923523 (2014) https://doi.org/10.1117/12.2066099
Sung Ha Woo, Dae Ho Hwang, Goo Min Jeong, Young Mo Lee, Sang Pyo Kim, Dong Gyu Yim
Proceedings Volume Photomask Technology 2014, 923524 (2014) https://doi.org/10.1117/12.2066275
Ralf Taumer, Thorsten Krome, Chuck Bowers, Ivin Varghese, Tyler Hopkins, Roy White, Martin Brunner, Daniel Yi
Proceedings Volume Photomask Technology 2014, 923525 (2014) https://doi.org/10.1117/12.2074473
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