PROCEEDINGS VOLUME 9511
SPIE OPTICS + OPTOELECTRONICS | 13-16 APRIL 2015
Damage to VUV, EUV, and X-ray Optics V
IN THIS VOLUME

0 Sessions, 9 Papers, 0 Presentations
Proceedings Volume 9511 is from: Logo
SPIE OPTICS + OPTOELECTRONICS
13-16 April 2015
Prague, Czech Republic
Front Matter: Volume 9511
Proc. SPIE 9511, Front Matter: Volume 9511, 951101 (2 June 2015); doi: 10.1117/12.2199434
Damage to Materials I
Proc. SPIE 9511, Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation, 951107 (12 May 2015); doi: 10.1117/12.2182778
Damage to Materials II
Proc. SPIE 9511, Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs, 95110C (12 May 2015); doi: 10.1117/12.2182633
Damage to Samples
Proc. SPIE 9511, Implications of the focal beam profile in serial femtosecond crystallography, 95110H (12 May 2015); doi: 10.1117/12.2182654
Theory of Damages
Proc. SPIE 9511, Thermal and nonthermal melting of silicon exposed to femtosecond pulses of x-ray irradiation, 95110I (12 May 2015); doi: 10.1117/12.2182765
Poster Session
Proc. SPIE 9511, Material properties of lithium fluoride for predicting XUV laser ablation rate and threshold fluence, 95110K (12 May 2015); doi: 10.1117/12.2178437
Proc. SPIE 9511, Compact laser produced plasma soft x-ray source for contact microscopy experiments, 95110L (12 May 2015); doi: 10.1117/12.2182713
Proc. SPIE 9511, X-ray-induced electron cascades in dielectrics modeled with XCASCADE code: effect of impact ionization cross sections, 95110M (12 May 2015); doi: 10.1117/12.2182767
Proc. SPIE 9511, Irradiation of low energy ions damage analysis on multilayers, 95110P (12 May 2015); doi: 10.1117/12.2181821
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