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PROCEEDINGS VOLUME PC12325
PHOTOMASK JAPAN 2022 | 26-28 APRIL 2022
Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Yosuke Kojima
Editor Affiliations +
IN THIS VOLUME
15 Sessions, 0 Papers, 21 Presentations
Opening Session: Day 1  (2)
EUV from U.S.  (1)
Special Session: EUV Mask Blanks  (1)
NIL I  (2)
NIL II  (3)
EUV for High NA  (1)
EUV Technologies  (2)
Curvilinear Data Handling  (1)
EUV Tools  (3)
Opening Session Day 3: EUV and Industry Trends  (1)
Inspection and Metrology  (1)
Flat Panel Display  (1)
Metrology and MPC  (1)
Writing Tools  (1)
Poster Session  (6)
Proceedings Volume PC12325 is from: Logo
PHOTOMASK JAPAN 2022
26-28 April 2022
Online Only, Japan
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Opening Session: Day 1
Innovations of innovations in photomasks Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232501 https://doi.org/10.1117/12.2656111
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ICAPS Market Trends and Key Inflections Driving Growth in the Semiconductor Equipment Segment Presentation
Shiva Rai
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232502 https://doi.org/10.1117/12.2640642
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EUV from U.S.
Development of a standalone zoneplate based EUV mask defect review tool Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232503 https://doi.org/10.1117/12.2656116
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Special Session: EUV Mask Blanks
Development of EUV blanks: history and future challenge Presentation
Takahiro Onoue
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232504 https://doi.org/10.1117/12.2656119
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NIL I
Nanoimprint edge placement error elements and control Presentation
Ryo Nawata
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232505 https://doi.org/10.1117/12.2656121
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Study of pattern quality improvement in replica template process Presentation
Ryo Kobayashi
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232506 https://doi.org/10.1117/12.2656129
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NIL II
Optical metasurfaces for advanced imaging Presentation
Masashi Miyata
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232507 https://doi.org/10.1117/12.2656133
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Nanostructured plasmonic metasurface gives a hand to chiral self-assembly Presentation
Hiromasa Niinomi
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232508 https://doi.org/10.1117/12.2656135
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Development of nano-imprint lithography template for fine feature hole layers of next generation devices Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1232509 https://doi.org/10.1117/12.2656138
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EUV for High NA
High-NA EUVL exposure tool: program progress and mask interaction Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250A https://doi.org/10.1117/12.2656140
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EUV Technologies
The EUV mask exposed Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250B https://doi.org/10.1117/12.2641306
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Stand-alone EUV setups for photomask related inspection tasks Presentation
Sascha Brose
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250C https://doi.org/10.1117/12.2656141
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Curvilinear Data Handling
Verification methods for curvilinear and real-curve geometries Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250D https://doi.org/10.1117/12.2656142
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EUV Tools
SEM-based photo mask repair Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250E https://doi.org/10.1117/12.2656143
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Novel actinic solution and its application for EUV mask HVM Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250F https://doi.org/10.1117/12.2656144
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AIMS EUV phase metrology: ZEISS solution for the characterization of EUV phase shift masks Presentation
Renzo Capelli
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250G https://doi.org/10.1117/12.2656145
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Opening Session Day 3: EUV and Industry Trends
Advanced and affordable EUV lithography with deep-dive mitigation of ML defects Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250H https://doi.org/10.1117/12.2656146
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Inspection and Metrology
SEM-based VSB writer defects DL classification system Presentation
Ajay K. Baranwal
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250I https://doi.org/10.1117/12.2656150
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Flat Panel Display
Flat panel display technological outlook and required techniques for photomask manufacturing Presentation
Youngjin Park
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250J https://doi.org/10.1117/12.2656151
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Metrology and MPC
Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250K https://doi.org/10.1117/12.2656152
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Writing Tools
Laser mask writer addressable to 90nm nodes with sustainability considered Presentation
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250L https://doi.org/10.1117/12.2656154
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Poster Session
Spectral evaluation of ionic debris in a laser-produced Sn plasma Poster
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250M https://doi.org/10.1117/12.2656155
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High irradiance illuminator for transmission extreme ultraviolet microscopy Poster
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250N https://doi.org/10.1117/12.2656157
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Hydrogen cleaning evaluation of Mo/Si multilayer using an EUV irradiation tool at NewSUBARU Poster
Tetsuo Harada
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250O https://doi.org/10.1117/12.2656159
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Development of grazing-incidence coherent EUV scatterometry microscope for resist pattern observation Poster
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250P https://doi.org/10.1117/12.2656161
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High-precision EUV mask process development Poster
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250Q https://doi.org/10.1117/12.2656163
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Inline model-base mask process correction embedded on multi-beam mask writer MBM-2000 Poster
Proceedings Volume Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250R https://doi.org/10.1117/12.2656164
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