Berkeley MET5 enters mature phase of research

Christopher N. Anderson

doi:10.1117/12.2643076

11 November 2022 Berkeley MET5 enters mature phase of research

Christopher N. Anderson

Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC1229206 (2022) https://doi.org/10.1117/12.2643076
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Continued optimization and improvement of the hardware and procedures for litho, processing, and operations have brought the MET5 ecosystem into a mature phase of its research lifecycle. The past year resulted with improved focus control, improved image stabilization, improved dose calibration, improved processing, 2X increase in shift capacity, new diagnostics for exposure dose and illumination alignment, improved online tools for users to plan and run experiments, improved data security, improved consistency of wafer supply, and improved film thickness metrology. This paper provides a summary of these improvements and learnings.

Conference Presentation

Citation Download Citation

Christopher N. Anderson "Berkeley MET5 enters mature phase of research", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC1229206 (11 November 2022); https://doi.org/10.1117/12.2643076

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