Wafer-scale fabrication of low-loss lithium niobate integrated photonic devices

Reinhard Geiss; Andre Steinbach; Mohammadreza Younesi; Johannes Mühlenstädt; Thomas Käsebier; Frank Setzpfandt; Thomas Siefke; Thomas Pertsch; Falk Eilenberger

doi:10.1117/12.3000981

13 March 2024 Wafer-scale fabrication of low-loss lithium niobate integrated photonic devices

Reinhard Geiss, Andre Steinbach, Mohammadreza Younesi, Johannes Mühlenstädt, Thomas Käsebier, Frank Setzpfandt, Thomas Siefke, Thomas Pertsch, Falk Eilenberger

Author Affiliations +

Proceedings Volume PC12889, Integrated Optics: Devices, Materials, and Technologies XXVIII; PC128890Q (2024) https://doi.org/10.1117/12.3000981
Event: SPIE OPTO, 2024, San Francisco, California, United States

Abstract

Lithium niobate, and more recently thin film lithium niobate on insulator (LNOI, TFLN), is a widely used material in integrated photonics due to its excellent optical and electro-optic properties. With the increasing demand for high-speed, high integration density photonic devices, lithium niobate integrated photonics has become an active research area. The focus of the presented technology development is on low-loss waveguides (below 0.1 dB/cm) that enable the integration of a wide variety of devices, including modulators, resonators and frequency converters, on a single chip for applications in quantum technologies. Implications and challenges of wafer-scale fabrication will be discussed.

Conference Presentation

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Reinhard Geiss, Andre Steinbach, Mohammadreza Younesi, Johannes Mühlenstädt, Thomas Käsebier, Frank Setzpfandt, Thomas Siefke, Thomas Pertsch, and Falk Eilenberger "Wafer-scale fabrication of low-loss lithium niobate integrated photonic devices", Proc. SPIE PC12889, Integrated Optics: Devices, Materials, and Technologies XXVIII, PC128890Q (13 March 2024); https://doi.org/10.1117/12.3000981

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