1 March 1974 An Iron Oxide Mask Blank For Photofabrication Of High Density Low Defect Integrated Circuits
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Abstract
The use of hard surface film masks in integrated circuit photo-fabrication has increased dramatically in the past few years. The proven manufacturing economies and inherent resolution capability of hard surface masks are the major forces behind this increase.
© (1974) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M.Patrick Risen, M.Patrick Risen, } "An Iron Oxide Mask Blank For Photofabrication Of High Density Low Defect Integrated Circuits", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954249; https://doi.org/10.1117/12.954249
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