1 March 1974 Application Of Plasmas To Semiconductor Materials And Fabrication
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Abstract
The use of plasmas -- low temperature gas discharges -- for semiconductor materials fabrication or processing is gaining widespread acceptance in the industry. This review will focus on the high application areas in micro-electronics for plasmas. These include photoresist removal, various substrate "cleaning" applications, etching of passivation layers, and thin film deposition.
© (1974) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Hollahan, John Hollahan, James Mitzel, James Mitzel, } "Application Of Plasmas To Semiconductor Materials And Fabrication", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); doi: 10.1117/12.954257; https://doi.org/10.1117/12.954257
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