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1 March 1974 Application Of Plasmas To Semiconductor Materials And Fabrication
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Abstract
The use of plasmas -- low temperature gas discharges -- for semiconductor materials fabrication or processing is gaining widespread acceptance in the industry. This review will focus on the high application areas in micro-electronics for plasmas. These include photoresist removal, various substrate "cleaning" applications, etching of passivation layers, and thin film deposition.
© (1974) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Hollahan and James Mitzel "Application Of Plasmas To Semiconductor Materials And Fabrication", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); https://doi.org/10.1117/12.954257
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