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1 March 1974 Mask Duplicator, Using Vacuum Contact
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Abstract
Two plates are placed in an exposure frame using a vacuum applied around the periphery while atmospheric pressure is maintained on the outside surfaces to force the plates into contact without trapped gas between. Integrated watt-second exposure is used with a controlled coherence source, allowing micron images.
© (1974) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert E. Lewis and Philip E. Chandler "Mask Duplicator, Using Vacuum Contact", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); https://doi.org/10.1117/12.954246
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