20 September 1976 Improved Microphotographic Systems In The Semiconductor Industry
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Abstract
Experimental work on a new photographic material and associated process technology. are described with reference to the requirements of the manufacturers of advanced micro electronic devices with high, packing density. The microphotographic process is demonstrated practically for contact printing in a negative situation as well as in a positive/positive situation. The capacity of the new microphotographic process to control accurately the initial dimensions on the micro-image is of great significance in order to define the geolletry of the device to be designed.
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Philippaerts, W. Vanassche, R. Duville, "Improved Microphotographic Systems In The Semiconductor Industry", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954832; https://doi.org/10.1117/12.954832
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