20 September 1976 Masking With Matched Sets
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Abstract
The emphasis today in wafer fabrication is to continually improve device yields. This is usually accomplished at the expense of the mask maker, who is consistently being requested to provide masks of higher and higher quality. Higher mask quality is also desired due to the long-life masks, especially when used with a proximity or projection printing system. A mask inspection and usage scheme has been developed, based on an age-old inspection technique, whereby higher device yields can be realized without paying the price of increasing mask quality.
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. H. DePuy, "Masking With Matched Sets", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954837; https://doi.org/10.1117/12.954837
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