20 September 1976 New Approaches For High Repeatibility Mask Making And Mask Measuring
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Abstract
A step repeater and a mask measuring machine have been designed and tested. One of the important goals of the development for both machines was realising small repeatibility errors. For this purpose special principles in measuring techniques,in positioning systems and in design principles have been adheared which are being described, together with the concept of computer controll. For the measuring machine a newly developed two-coordinate photoelectric-microscope is being used as pick up. Repeatibility errors are for the step repeater 0,1 μm measured on different mask plates, and for the mask measuring machine o,o8 μm, 1 sigma value.
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans-Dieter Jacoby, "New Approaches For High Repeatibility Mask Making And Mask Measuring", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954847; https://doi.org/10.1117/12.954847
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