20 September 1976 Photomask Inspection Techniques For Predicting And Maximizing LSI Yield
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Abstract
The impact of mask quality on wafer yield can hardly be debated. Photomask quality can seriously limit wafer yield, but that limitation can be minimized by effective mask inspection and process control. Techniques for predicting mask limited yield will be presented in conjunction with a discussion of methods for maximizing yields through appropriate process controls.
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mary L. Long, Mary L. Long, Franklin L. Long, Franklin L. Long, } "Photomask Inspection Techniques For Predicting And Maximizing LSI Yield", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); doi: 10.1117/12.954845; https://doi.org/10.1117/12.954845
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