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20 September 1976 Photomask quality problems
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Abstract
The problems associated with photomask production are categorized as follow:
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Reynold M. Shoho "Photomask quality problems", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954849
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