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8 August 1977 Reticles By Automatic Pattern Generation
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Abstract
The automatic production of reticles for semiconductor masks has become a well-established production technique using optical pattern generators. The important characteristics of these generators are defined and a comparison made of the types in general use today. The advantages and disadvantages of the optical and electron beam generators as related to reticle-making are defined and discussed. In a general overview of mask requirements, the characteristics of masks currently in use are related to the trends of the future.
© (1977) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gerald M. Henriksen "Reticles By Automatic Pattern Generation", Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); https://doi.org/10.1117/12.955358
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