8 August 1977 The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists
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Abstract
The chemical nature of positive working photoresists is examined in the choice of various components and their effect on the practical performance characteristics. The contribution of several potential resist components, alone and in combination, is described.
© (1977) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Donald W. Frey, Donald W. Frey, } "The Chemical Nature And Practical Processing Characterization Of Positive Working Photoresists", Proc. SPIE 0100, Developments in Semiconductor Microlithography II, (8 August 1977); doi: 10.1117/12.955354; https://doi.org/10.1117/12.955354
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