Modulated Light Ellipsometry At 10.6 m

M. E. Pedinoff; M. Braunstein; O. M. Stafsudd

doi:10.1117/12.955545

19 October 1977 Modulated Light Ellipsometry At 10.6 μm

M. E. Pedinoff, M. Braunstein, O. M. Stafsudd

Proceedings Volume 0112, Optical Polarimetry: Instrumentation and Applications; (1977) https://doi.org/10.1117/12.955545
Event: 21st Annual Technical Symposium, 1977, San Diego, United States

Abstract

In this paper we highlight the salient features of the Hughes Modulated Light Ellipsometer system including the details of the critical optical and electronic components. We present an analytical discussion of the effects of various experimental errors, including signal stability and sample alignment, on the accuracy of the system for substrate and thin-film measurements. The regions of optimum measurement accuracy deduced from these analytical studies are used as an experimental guide in the laboratory. The system has been used to study various substrates and film-substrate systems including ThF4, ZnSe, KCl, CdTe, ZnSe on KCl, and ThF4 on ZnSe. The results of these measurements are presented and discussed.

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M. E. Pedinoff, M. Braunstein, and O. M. Stafsudd "Modulated Light Ellipsometry At 10.6 μm", Proc. SPIE 0112, Optical Polarimetry: Instrumentation and Applications, (19 October 1977); https://doi.org/10.1117/12.955545

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KEYWORDS

Refractive index

Modulators

Error analysis

Modulation

Thin films

Ellipsometry

Optical amplifiers

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