Patterned Optical Filters To Encode Spectral Information For Solid State Imaging Devices

John Murphy

doi:10.1117/12.955638

15 December 1977 Patterned Optical Filters To Encode Spectral Information For Solid State Imaging Devices

John Murphy

Proceedings Volume 0116, Solid-State Imaging Devices; (1977) https://doi.org/10.1117/12.955638
Event: 21st Annual Technical Symposium, 1977, San Diego, United States

Abstract

Patterned optical filters have been used for color TV cameras and infrared imaging systems. These filters can be manufactured by combining the techniques of micro-photolithography and resist lift-off. Micro patterns containing single-band or multi-band filtering can be produced on the surface of a single element. Current capabilities for the production of patterned filters will be reviewed, along with the practical limitations imposed by manufacturing techniques. Spectral characteristics required for visible and infrared applications will be discussed and compared with the characteristics commonly achieved in routine manufacture. Limitations on filter thickness, pattern size and pattern geometry which are dependent on the production techniques, will be treated. Micrographs of typical patterns will be presented for illustration. Practical manufacturing tolerances will be discussed. Prototype development work in thicker filters, tighter tolerances, and miniaturized patterns will be presented.

Citation Download Citation

John Murphy "Patterned Optical Filters To Encode Spectral Information For Solid State Imaging Devices", Proc. SPIE 0116, Solid-State Imaging Devices, (15 December 1977); https://doi.org/10.1117/12.955638

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