21 November 1977 Aspheric Generation By Sputtering Techniques
Author Affiliations +
Abstract
A new method-of generating aspheric elements is discussed. In this method, the aspheric element is produced by sputtering a non-uniform, but radially symmetric. coatino onto the substrate. The desired non-uniformity is produced by selective masking of the substrate. As proof of the concept, an 8.25-inch diameter aspheric element was made. This asphere has a maximum departure from spherical of 84pm and a maximum slope deviation from spherical of 132µm/in. The finished sputtered asphere departed from the design asphere by 0.38µm.
© (1977) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vic Bennett, Jack Smith, "Aspheric Generation By Sputtering Techniques", Proc. SPIE 0126, Clever Optics: Innovative Applications of Optics, (21 November 1977); doi: 10.1117/12.955892; https://doi.org/10.1117/12.955892
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT

Roughness reduction on aspheric surfaces
Proceedings of SPIE (February 26 2015)
It's the subtleties that make the difference
Proceedings of SPIE (February 26 2004)
Coarse Aspheric Metrology
Proceedings of SPIE (May 27 1982)
Theoretical analysis of stressed mirror polishing
Proceedings of SPIE (May 20 2009)
Bend-And-Polish Fabrication Techniques
Proceedings of SPIE (October 22 1985)
Generation Of Off-Axis Aspherics
Proceedings of SPIE (November 04 1982)

Back to Top