Translator Disclaimer
6 September 1978 A New VLSI Printer
Author Affiliations +
In order to accurately achieve VLSI micro-lithography for integrated circuit applications, with high throughput, new optical printing systems are required. The manufacturer of a projection alignment system must contend with and solve numerous problems in optical, electronic, and mechanical technologies. This paper describes a new projection aligner, and the solutions which were employed to achieve the desired goals. Test results are given where applicable. Included is the basic optical concept, methods of achieving VLSI precision alignment, operator-machine interaction, and the high intensity exposure system. In addition, for VLSI imaging,an automatic focusing system has been designed which monitors the focus of the wafer through the actual optical path. A system of automatic wafer alignment will also be described.
© (1978) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas W. Novak "A New VLSI Printer", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978);


Industry User Forum Use Of Off Contact Printing In...
Proceedings of SPIE (March 01 1974)
New Generation Of 1:1 Optical Projection Mask Aligners
Proceedings of SPIE (July 17 1979)
Registration Accuracy In Several Versions Of A Scanning 1 1...
Proceedings of SPIE (September 13 1982)
Mix And Match Of 10 1 Wafer Steppers With Die...
Proceedings of SPIE (September 13 1982)
A Better Mousetrap
Proceedings of SPIE (July 17 1979)
A New Step By Step Aligner For Very Large Scale...
Proceedings of SPIE (September 05 1980)

Back to Top