6 September 1978 Adhesion Of Chromium Films To Various Glasses Used In Photomasks
Author Affiliations +
Abstract
The adhesion of chromium films to various glass substrates has been studied in various glass composition. 16 types of glasses were prepared by substituting B2O3 for SiO2, Al203 for CaO, and RO and R2O for CaO respectively in an almino-silicate glass. The adhesion of chromium films is evaluated by the so-called "scratch test" and observation of pinholes generated by ultrasonic agitation. It was found that a) with increased content of B2O3, pinhole density, ρ, increased and critical load Wc, at which film was stripped from substrate by scratching, decreased, b) with substitution of RO for CaO, ρ became larger in the order of CaO < MgO, ZnO < SrO, BaO, PbO, and Wc decreased in the order of MgO > CaO > ZnO > SrO, BaO, PbO, c) with R2O3 substitution, ρ decreased in the order of K2O, Na2O, Li2O. Thus, it is clear that B2O3, BaO, SrO, PbO, K2O and Na2O in glass contribute to poor adhesion of chromium films. It was also fauna that HOYA LE-30 glass had excellent adhesion to exceed an ordinary alumino-boro-silicate glass.
© (1978) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuji Nakajima, Tetsuro lzumitani, Yasuo Fukuoka, "Adhesion Of Chromium Films To Various Glasses Used In Photomasks", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); doi: 10.1117/12.956127; https://doi.org/10.1117/12.956127
PROCEEDINGS
5 PAGES


SHARE
RELATED CONTENT

New grade of 9 inch size mask blanks for 450mm...
Proceedings of SPIE (November 11 2015)
Prototyping 9 inch size PSM mask blanks for 450mm wafer...
Proceedings of SPIE (October 04 2016)
Cleaning Of Chromium On Glass Photomasks And Reticles
Proceedings of SPIE (July 28 1981)
Yb3+ P2O5-RO phosphate laser glasses
Proceedings of SPIE (July 23 1999)

Back to Top