6 September 1978 One Micron Range Photoresist Imaging: A Practical Approach
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Abstract
Submicron photoresist imaging technology is discussed in terms of its use in the production of semicon-ductor devices. Photoresist processing techniques necessary for one micron work are reviewed, and optimization techniques presented. Recent developments in semiconductor technology that contribute to sub-micron photolithography are covered, and all major process fabrication steps are reviewed. SEM's showing one micron range images in positive photoresist, along with parameters used to generate them, are presented. Finally, recommendations are made for establishing a one micron range photoresist imaging process.
© (1978) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David J. Elliott, Mary Ann Hockey, "One Micron Range Photoresist Imaging: A Practical Approach", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); doi: 10.1117/12.956123; https://doi.org/10.1117/12.956123
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