Orwell's world of 1984 utilizes a highly sophisticated computer and telecommunications network. At this time photoresists are still considered a necessary and vital component in the high volume microminiturization needed to produce these sophisticated electronics. Philip A. Hunt Chemical Corporation is deeply dedicated to the advancement of current photoresist technology, and presently has active research programs in electron beam, x-ray, and deep-uv lithography. The major aim of this paper will be to show how successfully the goals of our programs have been met. The primary emphasis will be to describe the results of our program to develop a marketable x-ray resist, and secondly, to discuss the current status of our programs on e-beam and deep-uv resists. Data will be given to show the performance of the various resists under active investigation.
Donald W. Johnson,
"How Photoresists Relate To The World Of 1984", Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); doi: 10.1117/12.957185; https://doi.org/10.1117/12.957185