17 July 1979 Optical Measuring Technology Of The Micropatterns
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Abstract
This paper describes three optical measuring machines which have been recently developed for state-of-the-art microlithography, as follows: (1) X-Y measuring machine for checking photomask registration. Utilizing a photoelectric microscope and a laser interferometer, this machine has a repeatability of less than O.lμm, covering a measuring range of 6 inches. (2) Measuring machine for critical line width (1 - 100µm) of photomask. This machine likewise utilizes the latest photoelectric detection technology; it has a repeatability of approximately 0.05µm. (3) Measuring machine for wafer and photomask micropatterns. A newly developed system which makes use of laser beam technology is incorporated in this machine; measurement repeatability is approximately 0.05µm.
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S. Yoshida, K. Nakazawa, A. Tanimoto, "Optical Measuring Technology Of The Micropatterns", Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); doi: 10.1117/12.957187; https://doi.org/10.1117/12.957187
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