27 July 1979 Electrooptic Deflector Design Considerations For Use In The Crystal Streak Camera
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Proceedings Volume 0189, 13th Intl Congress on High Speed Photography and Photonics; (1979) https://doi.org/10.1117/12.957627
Event: 13th International Congress on High Speed Photography and Photonics, 1978, Tokyo, Japan
Abstract
Figure-of-merit equations for material selection and detailed design equations have been developed to aid in the design of a linear electrooptic deflector element for use in a 10-ps streak camera. The figure of merit indicates that BaTiO3, KTN, and ammonium oxalate (AMO) are suitable materials. Possible deflector designs, including that of a current AMO prototype development program, are discussed. Quadratic (Kerr-effect) operation and materials are discussed along with the possibility for 10.6-μm-wavelength use.
© (1979) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. W. Thomas, S. W. Thomas, } "Electrooptic Deflector Design Considerations For Use In The Crystal Streak Camera", Proc. SPIE 0189, 13th Intl Congress on High Speed Photography and Photonics, (27 July 1979); doi: 10.1117/12.957627; https://doi.org/10.1117/12.957627
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