14 May 1980 E-beam Computer Generated Holograms For Aspheric Testing
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Proceedings Volume 0215, Recent Advances in Holography; (1980) https://doi.org/10.1117/12.958422
Event: 1980 Los Angeles Technical Symposium, 1980, Los Angeles, United States
Abstract
This paper discusses recent progress in producing computer-generated holograms (CGH) of low spatial distoration and high space-bandwidth product. The CGH are drawn directly on electron-resist using an electron beam pattern generator which is intended for use in the production of integrated circuits with sub-micron feature sizes. This approach not only reduces plotting errors below those introduced by indirect writing methods, but also provides more than 106 distortion-free resolution points in a hologram of correct size. The quality of the CGH made by this process will be illustrated by an example in the testing of an aspheric surface.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. M. Leung, K. M. Leung, J. C. Lindquist, J. C. Lindquist, L. T. Shepherd, L. T. Shepherd, } "E-beam Computer Generated Holograms For Aspheric Testing", Proc. SPIE 0215, Recent Advances in Holography, (14 May 1980); doi: 10.1117/12.958422; https://doi.org/10.1117/12.958422
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