5 September 1980 Evaluation Of Deep-UV Proximity Mode Printing
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Abstract
Proximity mode printing technology has the potential to achieve adequate defect levels for economical fabrication of VLSI devices. The application of deep-UV to proximity mode printing is evaluated in order to extend achievable resolution to greater wafer-to-mask separations. This technique promises to be a viable supplemental technology to wafer stepper technology.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. O. Massetti, D. O. Massetti, M. A. Hockey, M. A. Hockey, D. L. McFarland, D. L. McFarland, "Evaluation Of Deep-UV Proximity Mode Printing", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958621; https://doi.org/10.1117/12.958621
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