Photoresist Coated Chromium-On-Glass Substrate Parameters And Their Effect On Photomask Yield

J. E. Levine; H. C. Schick

doi:10.1117/12.958635

5 September 1980 Photoresist Coated Chromium-On-Glass Substrate Parameters And Their Effect On Photomask Yield

J. E. Levine, H. C. Schick

Proceedings Volume 0221, Developments in Semiconductor Microlithography V; (1980) https://doi.org/10.1117/12.958635
Event: Semiconductor Microlithography V, 1980, San Jose, United States

Abstract

The specifications for photoresist coated chromium-on-glass substrates used in the manufacture of masks in optical systems will be presented. The specifications were based on data derived from experiments using 2 μm geometries over a field of 9 mm as the image criteria. The impact of the following parameters will be presented: 1) Resist thickness uniformity within a plate and throughout a lot on image size and/or development time, 2) Reflectivity, chromium thickness, exposure and substrate flatness. A comparison of etching techniques and its effect on yield is included, and 3) The use of the IBM 7840 film thickness analyzer as a process control tool and material monitor will also be discussed.

Citation Download Citation

J. E. Levine and H. C. Schick "Photoresist Coated Chromium-On-Glass Substrate Parameters And Their Effect On Photomask Yield", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); https://doi.org/10.1117/12.958635

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