5 September 1980 Photoresist Coated Chromium-On-Glass Substrate Parameters And Their Effect On Photomask Yield
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Abstract
The specifications for photoresist coated chromium-on-glass substrates used in the manufacture of masks in optical systems will be presented. The specifications were based on data derived from experiments using 2 μm geometries over a field of 9 mm as the image criteria. The impact of the following parameters will be presented: 1) Resist thickness uniformity within a plate and throughout a lot on image size and/or development time, 2) Reflectivity, chromium thickness, exposure and substrate flatness. A comparison of etching techniques and its effect on yield is included, and 3) The use of the IBM 7840 film thickness analyzer as a process control tool and material monitor will also be discussed.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. E. Levine, H. C. Schick, "Photoresist Coated Chromium-On-Glass Substrate Parameters And Their Effect On Photomask Yield", Proc. SPIE 0221, Developments in Semiconductor Microlithography V, (5 September 1980); doi: 10.1117/12.958635; https://doi.org/10.1117/12.958635
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