16 September 1980 New Lenses For Microlithography
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Proceedings Volume 0237, 1980 International Lens Design Conference; (1980) https://doi.org/10.1117/12.959098
Event: 1980 International Lens Design Conference, 1980, Oakland, United States
Abstract
Giving the imaging bundle of rays two substantial bulges makes it possible to design 10x reduction lenses with large aperture and field size for microlithography without using high index glasses with poor transmission.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Erhard Glatzel, Erhard Glatzel, } "New Lenses For Microlithography", Proc. SPIE 0237, 1980 International Lens Design Conference, (16 September 1980); doi: 10.1117/12.959098; https://doi.org/10.1117/12.959098
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