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25 February 1981 Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits
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The principles and techniques of writing various types of micro gratings directly on chalcogenide (As2S3) film waveguides using the electron beam are reviewed. A computer-controlled apparatus has been developed so that we can fabricate any gratings of uniform/ chirped periods with slant lines which have the area of the order of 1 mm2, the diffraction efficiency of nearly 100 %, and the minimum grating period of 0.2 µm. Combination of those micro gratings results in integrated grating circuits (IGC). An IGC for guided-beam multiple division has been successfully fabricated.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Nishihara, Y. Handa, T. Suhara,, and J. Kovama "Electron-Beam Directly Written Micro Gratings For Integrated Optical Circuits", Proc. SPIE 0239, Guided Wave Optical and Surface Acoustic Wave Devices: Systems and Applications, (25 February 1981);

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