19 November 1980 10.6 Micron Wavelength Interferometry And The Measurement Of Infrared Transmitting Materials Index Of Refraction Homogeneity
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Proceedings Volume 0255, Practical Electro-Optical Instruments and Techniques; (1980) https://doi.org/10.1117/12.959559
Event: 1980 Huntsville Technical Symposium, 1980, Huntsville, United States
Abstract
Infrared optical systems, due primarily to military requirements, have made the transition from simple condenser optics which throw "heat" onto a discrete detector to diffraction limited imaging optics which are used to "view" in the infrared or illuminate high spatial resolution focal plane detector systems. Optically polished infrared lens element surfaces can be checked for sphericity and radius of curvature using conventional laser interferometry. However, the characterization of infrared material index of refraction homogeneity has been overlooked. To meet these newly emerging problems head on, Tropel developed TIRIS, the Tropel Infrared Interferometer System. The goal of this paper is to illustrate the importance of index inhomogeneity measurements by citing the degradation in performance (wavefront and Optical Transfer Function) of optical systems, caused by material inhomogeneities. A far infrared interferometer will be introduced, its basic construction outlined, and pertinent measurement parameters and formulas defined. Test results are shown of determining index inhomogeneity of two infrared transmitting samples.
© (1980) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Charles E. Synborski, Mary J. Hanes, "10.6 Micron Wavelength Interferometry And The Measurement Of Infrared Transmitting Materials Index Of Refraction Homogeneity", Proc. SPIE 0255, Practical Electro-Optical Instruments and Techniques, (19 November 1980); doi: 10.1117/12.959559; https://doi.org/10.1117/12.959559
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