Cleaning Of Chromium On Glass Photomasks And Reticles

David L. Angel; Paul H. Johnson; Scott Ashkenaz

doi:10.1117/12.931894

28 July 1981 Cleaning Of Chromium On Glass Photomasks And Reticles

David L. Angel, Paul H. Johnson, Scott Ashkenaz

Proceedings Volume 0275, Semiconductor Microlithography VI; (1981) https://doi.org/10.1117/12.931894
Event: 1981 Microlithography Conferences, 1981, San Jose, United States

Abstract

Solvent and plasma cleaning of RF sputtered, DC sputtered, and vacuum evaporated chromium-chrome oxide films on soda-lime glass substrates was investigated. One-cycle cleaning was evaluated using KLA automatic inspection. Long-term (eleven-cycle) effects on critical dimension, optical density and reflectivity by each process were measured. Deposition type had no effect on cleaning efficiency, although each did show long term effects on linewidth and optical parameters. RF sputtered chrome reflectivity increased drastically with all types of cleaning. Chrome lines grew, as did the optical density. DC sputtered chrome demonstrated a decrease in density in some cleaning methods, while vacuum evaporated films varied in linewidth.

Citation Download Citation

David L. Angel, Paul H. Johnson, and Scott Ashkenaz "Cleaning Of Chromium On Glass Photomasks And Reticles", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); https://doi.org/10.1117/12.931894

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available