28 July 1981 Cleaning Of Chromium On Glass Photomasks And Reticles
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Proceedings Volume 0275, Semiconductor Microlithography VI; (1981); doi: 10.1117/12.931894
Event: 1981 Microlithography Conferences, 1981, San Jose, United States
Abstract
Solvent and plasma cleaning of RF sputtered, DC sputtered, and vacuum evaporated chromium-chrome oxide films on soda-lime glass substrates was investigated. One-cycle cleaning was evaluated using KLA automatic inspection. Long-term (eleven-cycle) effects on critical dimension, optical density and reflectivity by each process were measured. Deposition type had no effect on cleaning efficiency, although each did show long term effects on linewidth and optical parameters. RF sputtered chrome reflectivity increased drastically with all types of cleaning. Chrome lines grew, as did the optical density. DC sputtered chrome demonstrated a decrease in density in some cleaning methods, while vacuum evaporated films varied in linewidth.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David L. Angel, Paul H. Johnson, Scott Ashkenaz, "Cleaning Of Chromium On Glass Photomasks And Reticles", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931894; https://doi.org/10.1117/12.931894
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KEYWORDS
Contamination

Absorbance

Reflectivity

Photomasks

Particles

Plasma

Optical lithography

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