Positive Versus Negative: A Photoresist Analysis

Peter S. Gwozdz

doi:10.1117/12.931887

28 July 1981 Positive Versus Negative: A Photoresist Analysis

Peter S. Gwozdz

Proceedings Volume 0275, Semiconductor Microlithography VI; (1981) https://doi.org/10.1117/12.931887
Event: 1981 Microlithography Conferences, 1981, San Jose, United States

Abstract

Positive and negative photoresists are contrasted. Twelve parameters are listed with evaluation as to which photoresist gives superior results. Emphasized are resolution and dimension targeting. Reasons are given stating why positive gives better resolution and why dimension targeting is used.

Citation Download Citation

Peter S. Gwozdz "Positive Versus Negative: A Photoresist Analysis", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); https://doi.org/10.1117/12.931887

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