28 July 1981 Prospects Of A Plasma Focus Device As An Intense X-Ray Source For Fine Line Lithography
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The technological window for X-ray lithography is examined. What seems to narrow the technological window for X-ray lithography and remove the economical advantage is not a symptom of X-ray lithography but of the conventional means of generating X-rays. The type of source needed is an intense, pulsed X-ray source of suitable wavelength range. Although laser generated and other types of plasma generated, pulsed X-ray sources are being investigated, a plasma focus device has been ignored as a possible intense, pulsed, soft X-ray source which can satisfy the requirements of X-ray lithography. Here, means of generating an intense X-ray pulse from a plasma focus device which is suitable for lithographic needs is analyzed. Estimates of energy conversion efficiencies, spectrum of radiation, duration, and intensity of the radiation pulse are presented. Optimization, scaling considerations, and engineering solutions to anticipated difficulties are discussed.
© (1981) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. Kuyel, "Prospects Of A Plasma Focus Device As An Intense X-Ray Source For Fine Line Lithography", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931872; https://doi.org/10.1117/12.931872


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